SCHEMBL5458368

SCHEMBL5458368

CCCCCc1cccc(-c2ccccc2)c1Oc1c(CCCCC)cccc1-c1ccccc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PPARA Q07869 4/20 0.44
LIPG Q9Y5X9 1/20 0.44
NR1H2 P55055 1/20 0.43
NR1H3 Q13133 1/20 0.43
ALOX5 P09917 1/20 0.43
PTGS2 P35354 1/20 0.43
PDCD1 Q15116 1/20 0.41
CD274 Q9NZQ7 1/20 0.41
BID P55957 3/20 0.41
MCL1 Q07820 3/20 0.41
BCL2L1 Q07817 2/20 0.41
BAK1 Q16611 2/20 0.41
KAT8 Q9H7Z6 2/20 0.41
PPARG P37231 2/20 0.41
EP300 Q09472 1/20 0.41
KAT2A Q92830 1/20 0.41
KAT2B Q92831 1/20 0.41
KAT5 Q92993 1/20 0.41
SAE1 Q9UBE0 1/20 0.41
TLR8 Q9NR97 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30027582 0.88 PPARA (0.49) PPARALIPGNR1H2NR1H3ALOX5
SCHEMBL27671180 0.84 ALOX5 (0.43) PPARALIPGNR1H2NR1H3ALOX5
SCHEMBL11319245 0.83 LIPG (0.41) PPARALIPGNR1H2NR1H3ALOX5
SCHEMBL1026184 0.83 PPARA (0.53) PPARALIPGNR1H2NR1H3PDCD1
Methane SCHEMBL27552900 0.83 ALOX5 (0.42) PPARANR1H2NR1H3ALOX5PTGS2
SCHEMBL5458212 0.82 ALOX5 (0.53) PPARALIPGNR1H2NR1H3ALOX5
SCHEMBL761403 0.81 LIPG (0.55) PPARALIPGNR1H2NR1H3BID
SCHEMBL2303757 0.81 LIPG (0.55) PPARALIPGNR1H2NR1H3BID
SCHEMBL251097 0.81 LIPG (0.55) PPARALIPGNR1H2NR1H3BID
SCHEMBL8521601 0.81 LIPG (0.55) PPARALIPGNR1H2NR1H3BID

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070191540-A1 LOW DIELECTRIC LOSS RESIN, RESIN COMPOSITION, AND THE MANUFACTURING METHOD OF LOW DIELECTRIC LOSS RESIN HITACHI, LTD. (JP) 2007-08-16 US disclosed