SCHEMBL546302

SCHEMBL546302

O=C(OCCCCCCCCCCCCCCCCCCCCBr)C(F)(F)S(=O)(=O)OS(c1ccccc1)(c1ccccc1)c1ccccc1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.37
KMT2A Q03164 4/20 0.34
MEN1 O00255 3/20 0.34
GAA P10253 1/20 0.34
NPSR1 Q6W5P4 1/20 0.34
HDAC1 Q13547 1/20 0.34
HDAC2 Q92769 1/20 0.34
POLB P06746 1/20 0.34
CYP3A4 P08684 1/20 0.33
CYP2D6 P10635 1/20 0.33
HSD11B1 P28845 1/20 0.33
HTT P42858 2/20 0.32
MAPK1 P28482 1/20 0.32
TSHR P16473 1/20 0.32
CA12 O43570 2/20 0.32
CA1 P00915 2/20 0.32
CA2 P00918 2/20 0.32
CA9 Q16790 2/20 0.32
CHRM2 P08172 1/20 0.32
CHRM4 P08173 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL546331 1.00 TDP1 (0.37) TDP1KMT2AMEN1GAANPSR1
SCHEMBL2183099 1.00 TDP1 (0.37) TDP1KMT2AMEN1GAANPSR1
SCHEMBL546871 1.00 TDP1 (0.37) TDP1KMT2AMEN1GAANPSR1
SCHEMBL546827 1.00 TDP1 (0.37) TDP1KMT2AMEN1GAANPSR1
SCHEMBL547444 1.00 TDP1 (0.37) TDP1KMT2AMEN1GAANPSR1
SCHEMBL546351 0.94 HSD11B1 (0.36) TDP1KMT2AMEN1GAANPSR1
SCHEMBL546323 0.94 HSD11B1 (0.36) TDP1KMT2AMEN1GAANPSR1
SCHEMBL546858 0.94 HSD11B1 (0.36) TDP1KMT2AMEN1GAANPSR1
SCHEMBL546755 0.94 HSD11B1 (0.36) TDP1KMT2AMEN1GAANPSR1
SCHEMBL546935 0.94 HSD11B1 (0.35) TDP1KMT2AMEN1GAANPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524440-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-03 US disclosed
US-8110336-B2 Resin and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-07 US disclosed
US-20110165513-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY LTD (JP) 2011-07-07 US disclosed
US-20100075257-A1 Resin and Chemically Amplified Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-25 US disclosed