SCHEMBL546935

SCHEMBL546935

O=C(OCCCCCCBr)C(F)(F)S(=O)(=O)OS(c1ccccc1)(c1ccccc1)c1ccc(Br)cc1

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 1/20 0.35
FKBP1A P62942 1/20 0.34
TDP1 Q9NUW8 1/20 0.33
CTSL P07711 1/20 0.32
CTSS P25774 1/20 0.32
EGFR P00533 1/20 0.32
ERBB2 P04626 1/20 0.32
MEN1 O00255 3/20 0.32
KMT2A Q03164 3/20 0.32
GAA P10253 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
CA1 P00915 3/20 0.32
CA2 P00918 3/20 0.32
CA9 Q16790 3/20 0.32
CA12 O43570 2/20 0.32
NPC1 O15118 1/20 0.32
HPGD P15428 1/20 0.32
RAB9A P51151 1/20 0.32
MAPT P10636 1/20 0.32
POLB P06746 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL546827 0.94 TDP1 (0.37) HSD11B1TDP1MEN1KMT2AGAA
SCHEMBL546871 0.94 TDP1 (0.37) HSD11B1TDP1MEN1KMT2AGAA
SCHEMBL2183099 0.94 TDP1 (0.37) HSD11B1TDP1MEN1KMT2AGAA
SCHEMBL546302 0.94 TDP1 (0.37) HSD11B1TDP1MEN1KMT2AGAA
SCHEMBL547444 0.94 TDP1 (0.37) HSD11B1TDP1MEN1KMT2AGAA
SCHEMBL546331 0.94 TDP1 (0.37) HSD11B1TDP1MEN1KMT2AGAA
SCHEMBL546755 0.91 HSD11B1 (0.36) HSD11B1FKBP1ATDP1EGFRERBB2
SCHEMBL546323 0.91 HSD11B1 (0.36) HSD11B1FKBP1ATDP1EGFRERBB2
SCHEMBL546858 0.91 HSD11B1 (0.36) HSD11B1FKBP1ATDP1EGFRERBB2
SCHEMBL546351 0.91 HSD11B1 (0.36) HSD11B1FKBP1ATDP1EGFRERBB2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524440-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-03 US disclosed
US-8110336-B2 Resin and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-07 US disclosed
US-20110165513-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY LTD (JP) 2011-07-07 US disclosed
US-20100075257-A1 Resin and Chemically Amplified Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-25 US disclosed