SCHEMBL546501

SCHEMBL546501

O=C(OCCSCCCl)C(F)(F)S(=O)(=O)[O-].c1ccc([S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.31

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.31
TSHR P16473 1/20 0.31
HTT P42858 1/20 0.31
KMT2A Q03164 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL547029 0.85 TDP1 (0.37) MEN1TSHRHTTKMT2A
SCHEMBL546505 0.84 TDP1 (0.36) MEN1TSHRHTTKMT2A
SCHEMBL547133 0.84 KMT2A (0.32) MEN1TSHRHTTKMT2A
SCHEMBL547318 0.84 TDP1 (0.36) MEN1TSHRHTTKMT2A
SCHEMBL546806 0.84 TDP1 (0.36) MEN1TSHRHTTKMT2A
SCHEMBL547232 0.83 KMT2A (0.35) MEN1TSHRHTTKMT2A
SCHEMBL1634221 0.82 KMT2A (0.34) MEN1TSHRHTTKMT2A
SCHEMBL547386 0.81 KMT2A (0.34) MEN1TSHRHTTKMT2A
SCHEMBL546388 0.80 TDP1 (0.33) KMT2A
SCHEMBL546789 0.80 CPT1A (0.33) MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524440-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-03 US disclosed
US-8110336-B2 Resin and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-07 US disclosed
US-20110165513-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY LTD (JP) 2011-07-07 US disclosed
US-20100075257-A1 Resin and Chemically Amplified Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-25 US disclosed