SCHEMBL546522

SCHEMBL546522

O=C(OCCCCCCCCCCCCCCCCCCl)C(F)(F)S(=O)(=O)OS(c1ccccc1)(c1ccccc1)c1ccc(F)cc1

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA12 O43570 2/20 0.34
CA1 P00915 2/20 0.34
CA2 P00918 2/20 0.34
CA9 Q16790 2/20 0.34
HSD11B1 P28845 2/20 0.34
FKBP1A P62942 1/20 0.34
HDAC1 Q13547 4/20 0.33
HDAC2 Q92769 4/20 0.33
EGFR P00533 1/20 0.32
ERBB2 P04626 1/20 0.32
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31
HDAC3 O15379 2/20 0.31
HDAC4 P56524 2/20 0.31
HDAC7 Q8WUI4 2/20 0.31
HDAC10 Q969S8 2/20 0.31
HDAC11 Q96DB2 2/20 0.31
HDAC8 Q9BY41 2/20 0.31
HDAC6 Q9UBN7 2/20 0.31
HDAC9 Q9UKV0 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL547331 1.00 CA12 (0.34) CA12CA1CA2CA9HSD11B1
SCHEMBL546845 1.00 CA12 (0.34) CA12CA1CA2CA9HSD11B1
SCHEMBL546389 0.99 HSD11B1 (0.34) CA12CA1CA2CA9HSD11B1
SCHEMBL546831 0.96 CA1 (0.34) CA12CA1CA2CA9HSD11B1
SCHEMBL546614 0.96 CA1 (0.34) CA12CA1CA2CA9HSD11B1
SCHEMBL546807 0.94 HDAC1 (0.36) CA12CA1CA2CA9HDAC1
SCHEMBL547319 0.94 HDAC1 (0.36) CA12CA1CA2CA9HDAC1
SCHEMBL546506 0.94 HDAC1 (0.36) CA12CA1CA2CA9HDAC1
SCHEMBL547030 0.93 TDP1 (0.35) CA12CA1CA2CA9HDAC1
SCHEMBL546411 0.90 CA1 (0.35) CA12CA1CA2CA9HSD11B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524440-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-03 US disclosed
US-8110336-B2 Resin and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-07 US disclosed
US-20110165513-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY LTD (JP) 2011-07-07 US disclosed
US-20100075257-A1 Resin and Chemically Amplified Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-25 US disclosed