SCHEMBL547030

SCHEMBL547030

O=C(OCCCCCl)C(F)(F)S(=O)(=O)OS(c1ccccc1)(c1ccccc1)c1ccccc1

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.35
HDAC1 Q13547 4/20 0.35
HDAC2 Q92769 4/20 0.35
KMT2A Q03164 3/20 0.33
CA12 O43570 2/20 0.33
CA1 P00915 2/20 0.33
CA2 P00918 2/20 0.33
CA9 Q16790 2/20 0.33
HTT P42858 2/20 0.33
MEN1 O00255 2/20 0.33
MAPK1 P28482 1/20 0.33
TSHR P16473 1/20 0.33
MAPT P10636 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
HSD17B10 Q99714 1/20 0.32
POLB P06746 1/20 0.32
HDAC3 O15379 1/20 0.32
HDAC4 P56524 1/20 0.32
HDAC7 Q8WUI4 1/20 0.32
HDAC10 Q969S8 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL546807 0.99 HDAC1 (0.36) TDP1HDAC1HDAC2KMT2ACA12
SCHEMBL547319 0.99 HDAC1 (0.36) TDP1HDAC1HDAC2KMT2ACA12
SCHEMBL546506 0.99 HDAC1 (0.36) TDP1HDAC1HDAC2KMT2ACA12
SCHEMBL546389 0.94 HSD11B1 (0.34) TDP1HDAC1HDAC2KMT2ACA12
SCHEMBL546845 0.93 CA12 (0.34) HDAC1HDAC2KMT2ACA12CA1
SCHEMBL547331 0.93 CA12 (0.34) HDAC1HDAC2KMT2ACA12CA1
SCHEMBL546522 0.93 CA12 (0.34) HDAC1HDAC2KMT2ACA12CA1
SCHEMBL546411 0.92 CA1 (0.35) HDAC1HDAC2KMT2ACA12CA1
SCHEMBL546831 0.88 CA1 (0.34) KMT2ACA12CA1CA2CA9
SCHEMBL546614 0.88 CA1 (0.34) KMT2ACA12CA1CA2CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524440-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-03 US disclosed
US-8110336-B2 Resin and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-07 US disclosed
US-20110165513-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY LTD (JP) 2011-07-07 US disclosed
US-20100075257-A1 Resin and Chemically Amplified Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-25 US disclosed