SCHEMBL5465384

SCHEMBL5465384

CCN(CCO)C(=O)CCO

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.52
ALDH1A1 P00352 3/20 0.45
ALDH2 P05091 2/20 0.45
MMP1 P03956 1/20 0.39
MMP2 P08253 1/20 0.39
MMP3 P08254 1/20 0.39
MMP8 P22894 1/20 0.39
HPGD P15428 1/20 0.39
HTR2A P28223 4/20 0.36
HTR7 P34969 4/20 0.36
KCNH2 Q12809 4/20 0.36
DRD2 P14416 3/20 0.36
L3MBTL1 Q9Y468 1/20 0.35
CA12 O43570 2/20 0.34
CA1 P00915 2/20 0.34
CA9 Q16790 2/20 0.34
CA2 P00918 1/20 0.32
MAPT P10636 1/20 0.32
CNR1 P21554 2/20 0.32
CNR2 P34972 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25163064 0.88 LMNA (0.62) LMNAALDH1A1ALDH2MMP1MMP2
SCHEMBL8636679 0.88 LMNA (0.50) LMNAALDH1A1ALDH2MMP1MMP2
SCHEMBL3898597 0.87 LMNA (0.67) LMNAALDH1A1ALDH2MMP1MMP2
SCHEMBL822856 0.86 LMNA (0.60) LMNAALDH1A1ALDH2MMP1MMP2
SCHEMBL22083704 0.86 LMNA (0.60) LMNAALDH1A1ALDH2MMP1MMP2
SCHEMBL1387466 0.85 ALDH1A1 (0.39) LMNAALDH1A1ALDH2HPGDCA12
SCHEMBL27334664 0.85 LMNA (0.46) LMNAALDH1A1ALDH2MMP1MMP2
SCHEMBL28912905 0.83 ALDH1A1 (0.46) LMNAALDH1A1ALDH2MMP1MMP2
SCHEMBL134968 0.83 ALDH1A1 (0.46) LMNAALDH1A1ALDH2MMP1MMP2
SCHEMBL20352218 0.82 LMNA (0.67) LMNAALDH1A1ALDH2MMP1MMP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070272282-A1 Composition for Removing Photoresist and Method for Removing Photoresist NAGASE CHEMTEX CORPORATION (JP) 2007-11-29 US claimed
US-20070272282-A1 Composition for Removing Photoresist and Method for Removing Photoresist NAGASE CHEMTEX CORPORATION (JP) 2007-11-29 US disclosed