Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 3/20 | 0.36 |
| ▸ | CA2 | P00918 | 3/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.30 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL546353 | 0.88 | CA1 (0.36) | CA1CA2TDP1MEN1TSHR | |
| SCHEMBL547029 | 0.84 | TDP1 (0.37) | CA1CA2TDP1MEN1TSHR | |
| SCHEMBL547318 | 0.83 | TDP1 (0.36) | CA1CA2TDP1MEN1TSHR | |
| SCHEMBL546806 | 0.83 | TDP1 (0.36) | CA1CA2TDP1MEN1TSHR | |
| SCHEMBL546505 | 0.83 | TDP1 (0.36) | CA1CA2TDP1MEN1TSHR | |
| SCHEMBL546817 | 0.80 | L3MBTL1 (0.32) | TDP1MEN1TSHRHTTKMT2A | |
| SCHEMBL546388 | 0.80 | TDP1 (0.33) | TDP1KMT2AHDAC1HDAC2 | |
| SCHEMBL546789 | 0.80 | CPT1A (0.33) | TDP1MEN1KMT2AHDAC1HDAC2 | |
| SCHEMBL547383 | 0.80 | MEN1 (0.32) | TDP1MEN1TSHRHTTKMT2A | |
| SCHEMBL547247 | 0.79 | TDP1 (0.38) | CA1CA2TDP1MEN1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8524440-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-09-03 | — | — | US | disclosed |
| US-8110336-B2 | Resin and chemically amplified resist composition comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-02-07 | — | — | US | disclosed |
| US-20110165513-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY LTD (JP) | 2011-07-07 | — | — | US | disclosed |
| US-20100075257-A1 | Resin and Chemically Amplified Resist Composition Comprising the Same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-03-25 | — | — | US | disclosed |