⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3679065 | 0.75 | TSHR (0.37) | — | |
| SCHEMBL179790 | 0.71 | — | — | |
| SCHEMBL50084 | 0.71 | — | — | |
| SCHEMBL5604698 | 0.71 | — | — | |
| SCHEMBL10801938 | 0.69 | MAPT (0.30) | — | |
| SCHEMBL11841805 | 0.69 | MAPT (0.30) | — | |
| SCHEMBL20677886 | 0.69 | MAPT (0.30) | — | |
| SCHEMBL21045965 | 0.69 | MAPT (0.30) | — | |
| SCHEMBL714014 | 0.69 | LTA4H (0.43) | — | |
| SCHEMBL18833605 | 0.69 | MAPT (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1677343-B1 | COMPOSITION FOR FORMING ETCHING STOPPER LAYER | AZ ELECTRONIC MATERIALS USA (US) | 2012-11-14 | — | — | EP | disclosed |
| US-20070026667-A1 | Composition for forming etching stopper layer | TASHIRO YUJI | 2007-02-01 | — | — | US | disclosed |
| EP-1677343-A1 | COMPOSITION FOR FORMING ETCHING STOPPER LAYER | AZ Electronic Materials USA Corp. (US) | 2006-07-05 | — | — | EP | disclosed |
| US-20040081912-A1 | Photosensitive polysilazane composition and method of forming patterned polysilazane film | AZ ELECTRONIC MATERIALS USA CORP. | 2004-04-29 | — | — | US | disclosed |
| EP-0890599-B1 | POLYORGANOSILOXAZANES AND PROCESS FOR THE PREPARATION THEREOF | TONENGENERAL SEKIYU K K (JP) | 2002-09-04 | — | — | EP | disclosed |
| EP-1164435-A1 | PHOTOSENSITIVE POLYSILAZANE COMPOSITION AND METHOD OF FORMING PATTERNED POLYSILAZANE FILM | TonenGeneral Sekiyu K.K. (JP) | 2001-12-19 | — | — | EP | disclosed |
| US-6011167-A | CAPABLE OF BEING CONVERTED INTO A CERAMIC MATERIAL HAVING LOW DIELECTRIC CONSTANT. | TONEN CORPORATION (JP) | 2000-01-04 | — | — | US | disclosed |
| EP-0890599-A1 | POLYORGANOSILOXAZANES AND PROCESS FOR THE PREPARATION THEREOF | TONEN CORPORATION (JP) | 1999-01-13 | — | — | EP | disclosed |