SCHEMBL547211

SCHEMBL547211

Fc1ccc([S+](c2ccccc2)c2ccccc2)cc1.O=C(OCCl)C(F)(F)S(=O)(=O)[O-]

nearest known ligand 0.33

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 2/20 0.33
KMT2A Q03164 3/20 0.32
MEN1 O00255 1/20 0.32
TSHR P16473 1/20 0.32
HTT P42858 1/20 0.32
MAPT P10636 1/20 0.32
ALDH1A1 P00352 1/20 0.32
NOD2 Q9HC29 1/20 0.31
NOD1 Q9Y239 1/20 0.31
MMP1 P03956 1/20 0.31
MMP2 P08253 1/20 0.31
MMP3 P08254 1/20 0.31
MMP9 P14780 1/20 0.31
MMP12 P39900 1/20 0.31
MMP13 P45452 1/20 0.31
MMP14 P50281 1/20 0.31
KEAP1 Q14145 1/20 0.31
NFE2L2 Q16236 1/20 0.31
TAS2R14 Q9NYV8 1/20 0.30
EGFR P00533 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL547232 0.94 KMT2A (0.35) KMT2AMEN1TSHRHTTMAPT
SCHEMBL546388 0.88 TDP1 (0.33) HSD11B1KMT2A
SCHEMBL547330 0.87 HDAC1 (0.33) KMT2A
SCHEMBL546844 0.87 HDAC1 (0.33) KMT2A
SCHEMBL546521 0.87 HDAC1 (0.33) KMT2A
SCHEMBL547273 0.83 TDP1 (0.33) HSD11B1
SCHEMBL547298 0.82 TDP1 (0.33) HSD11B1
SCHEMBL546350 0.82 TDP1 (0.35) HSD11B1KMT2A
SCHEMBL547408 0.82 TDP1 (0.35) HSD11B1KMT2A
SCHEMBL547199 0.82 TDP1 (0.35) HSD11B1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524440-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-03 US disclosed
US-8110336-B2 Resin and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-07 US disclosed
US-20110165513-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY LTD (JP) 2011-07-07 US disclosed
US-20100075257-A1 Resin and Chemically Amplified Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-25 US disclosed