SCHEMBL547248

SCHEMBL547248

O=C(OCCCCCCBr)C(C(F)(F)F)(C(F)(F)F)S(=O)(=O)OS(c1ccccc1)(c1ccccc1)c1ccccc1

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.35
KMT2A Q03164 4/20 0.33
MEN1 O00255 3/20 0.33
HTT P42858 2/20 0.33
NPSR1 Q6W5P4 2/20 0.33
MAPK1 P28482 2/20 0.33
TSHR P16473 2/20 0.33
GAA P10253 2/20 0.33
POLB P06746 4/20 0.33
MAPT P10636 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
HSD17B10 Q99714 1/20 0.33
HDAC1 Q13547 1/20 0.33
HDAC2 Q92769 1/20 0.33
CYP3A4 P08684 1/20 0.32
CYP2D6 P10635 1/20 0.32
HSD11B1 P28845 1/20 0.32
CA12 O43570 2/20 0.31
CA1 P00915 2/20 0.31
CA2 P00918 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL546331 0.88 TDP1 (0.37) TDP1KMT2AMEN1HTTNPSR1
SCHEMBL546302 0.88 TDP1 (0.37) TDP1KMT2AMEN1HTTNPSR1
SCHEMBL2183099 0.88 TDP1 (0.37) TDP1KMT2AMEN1HTTNPSR1
SCHEMBL546827 0.88 TDP1 (0.37) TDP1KMT2AMEN1HTTNPSR1
SCHEMBL547444 0.88 TDP1 (0.37) TDP1KMT2AMEN1HTTNPSR1
SCHEMBL546871 0.88 TDP1 (0.37) TDP1KMT2AMEN1HTTNPSR1
SCHEMBL546351 0.83 HSD11B1 (0.36) TDP1KMT2AMEN1NPSR1GAA
SCHEMBL546323 0.83 HSD11B1 (0.36) TDP1KMT2AMEN1NPSR1GAA
SCHEMBL546755 0.83 HSD11B1 (0.36) TDP1KMT2AMEN1NPSR1GAA
SCHEMBL546858 0.83 HSD11B1 (0.36) TDP1KMT2AMEN1NPSR1GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524440-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-03 US disclosed
US-8110336-B2 Resin and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-07 US disclosed
US-20110165513-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY LTD (JP) 2011-07-07 US disclosed
US-20100075257-A1 Resin and Chemically Amplified Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-25 US disclosed