SCHEMBL546340

SCHEMBL546340

O=C(OCCCCCCCCCCCCCCCCCCCI)C(F)(F)S(=O)(=O)[O-].c1ccc([S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.36
HDAC1 Q13547 4/20 0.33
HDAC2 Q92769 4/20 0.33
CA12 O43570 2/20 0.32
CA1 P00915 2/20 0.32
CA2 P00918 2/20 0.32
CA9 Q16790 2/20 0.32
TSHR P16473 2/20 0.32
MEN1 O00255 1/20 0.32
HTT P42858 1/20 0.32
KMT2A Q03164 1/20 0.32
HDAC3 O15379 2/20 0.31
HDAC4 P56524 2/20 0.31
HDAC7 Q8WUI4 2/20 0.31
HDAC10 Q969S8 2/20 0.31
HDAC11 Q96DB2 2/20 0.31
HDAC8 Q9BY41 2/20 0.31
HDAC6 Q9UBN7 2/20 0.31
HDAC9 Q9UKV0 2/20 0.31
HDAC5 Q9UQL6 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL547113 1.00 TDP1 (0.36) TDP1HDAC1HDAC2CA12CA1
SCHEMBL547285 0.95 TDP1 (0.35) TDP1TSHRMEN1HTTKMT2A
SCHEMBL547031 0.94 TDP1 (0.33) TDP1HDAC1HDAC2PTGS2
SCHEMBL546476 0.94 TDP1 (0.33) TDP1HDAC1HDAC2PTGS2
SCHEMBL547298 0.94 TDP1 (0.33) TDP1HDAC1HDAC2PTGS2
SCHEMBL547271 0.90 HDAC1 (0.31) TDP1HDAC1HDAC2
SCHEMBL1634200 0.89 TDP1 (0.37) TDP1HDAC1HDAC2CA12CA1
SCHEMBL547269 0.89 TDP1 (0.37) TDP1HDAC1HDAC2CA12CA1
SCHEMBL2183095 0.88 TDP1 (0.39) TDP1HDAC1HDAC2CA12CA1
SCHEMBL546301 0.88 TDP1 (0.39) TDP1HDAC1HDAC2CA12CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524440-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-03 US disclosed
US-8110336-B2 Resin and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-07 US disclosed
US-20110165513-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY LTD (JP) 2011-07-07 US disclosed
US-20100075257-A1 Resin and Chemically Amplified Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-25 US disclosed