Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.30 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.30 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.30 |
| ▸ | BCHE | P06276 | 1/20 | 0.30 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL547298 | 1.00 | TDP1 (0.33) | TDP1HDAC1HDAC2PTGS2BCHE | |
| SCHEMBL547031 | 1.00 | TDP1 (0.33) | TDP1HDAC1HDAC2PTGS2BCHE | |
| SCHEMBL546340 | 0.94 | TDP1 (0.36) | TDP1HDAC1HDAC2PTGS2 | |
| SCHEMBL547113 | 0.94 | TDP1 (0.36) | TDP1HDAC1HDAC2PTGS2 | |
| SCHEMBL547273 | 0.90 | TDP1 (0.33) | TDP1HDAC1HDAC2BCHEHSD11B1 | |
| SCHEMBL547285 | 0.90 | TDP1 (0.35) | TDP1 | |
| SCHEMBL546521 | 0.89 | HDAC1 (0.33) | TDP1HDAC1HDAC2BCHE | |
| SCHEMBL547199 | 0.89 | TDP1 (0.35) | TDP1HDAC1HDAC2PTGS2BCHE | |
| SCHEMBL546322 | 0.89 | TDP1 (0.35) | TDP1HDAC1HDAC2PTGS2BCHE | |
| SCHEMBL547330 | 0.89 | HDAC1 (0.33) | TDP1HDAC1HDAC2BCHE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8524440-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-09-03 | — | — | US | disclosed |
| US-8110336-B2 | Resin and chemically amplified resist composition comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-02-07 | — | — | US | disclosed |
| US-20110165513-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY LTD (JP) | 2011-07-07 | — | — | US | disclosed |
| US-20100075257-A1 | Resin and Chemically Amplified Resist Composition Comprising the Same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-03-25 | — | — | US | disclosed |