Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL546861 | 1.00 | NAAA (0.31) | NAAAASAH1 | |
| SCHEMBL547422 | 0.91 | — | — | |
| SCHEMBL546969 | 0.91 | NAAA (0.31) | NAAAASAH1 | |
| SCHEMBL547353 | 0.88 | CHRM2 (0.35) | NAAAASAH1 | |
| SCHEMBL547071 | 0.82 | — | — | |
| SCHEMBL546690 | 0.81 | NAAA (0.30) | NAAAASAH1 | |
| SCHEMBL546634 | 0.80 | CHRM2 (0.33) | NAAAASAH1 | |
| SCHEMBL547322 | 0.77 | CHRM2 (0.30) | — | |
| SCHEMBL546862 | 0.77 | CHRM2 (0.30) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL515932 | 0.74 | CA1 (0.40) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8524440-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-09-03 | — | — | US | disclosed |
| US-8110336-B2 | Resin and chemically amplified resist composition comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-02-07 | — | — | US | disclosed |
| US-20110165513-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY LTD (JP) | 2011-07-07 | — | — | US | disclosed |
| US-20100075257-A1 | Resin and Chemically Amplified Resist Composition Comprising the Same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-03-25 | — | — | US | disclosed |