Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 2/20 | 0.40 |
| ▸ | CA2 | P00918 | 2/20 | 0.40 |
| ▸ | CA4 | P22748 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.30 |
| ▸ | CA12 | O43570 | 1/20 | 0.30 |
| ▸ | CA9 | Q16790 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL1078830 | 0.87 | CA1 (0.36) | CA1CA2CA4KMT2AMAPT | |
| Trifluoromethanesulfonic Acid SCHEMBL6140981 | 0.86 | CA1 (0.37) | CA1CA2CA4KMT2AMAPT | |
| SCHEMBL5364680 | 0.86 | CA2 (0.34) | CA1CA2CA4KMT2A | |
| Trifluoromethanesulfonic Acid SCHEMBL65803 | 0.85 | KMT2A (0.39) | CA1CA2CA4KMT2AMAPT | |
| SCHEMBL5367168 | 0.84 | CA2 (0.33) | CA1CA2CA4KMT2A | |
| Trifluoromethanesulfonic Acid SCHEMBL6821487 | 0.83 | CA1 (0.34) | CA1CA2CA4KMT2A | |
| SCHEMBL685946 | 0.82 | CA1 (0.50) | CA1CA2CA4KMT2AMAPT | |
| Trifluoromethanesulfonic Acid SCHEMBL6140329 | 0.82 | KMT2A (0.35) | CA1CA2CA4KMT2A | |
| Trifluoromethanesulfonic Acid SCHEMBL64419 | 0.81 | CA1 (0.31) | CA1CA2CA4KMT2A | |
| Trifluoromethanesulfonic Acid SCHEMBL516028 | 0.81 | KMT2A (0.37) | CA1CA2CA4KMT2AMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 270 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0745633-B1 | Si containing high molecular compound and photosensitive resin composition | NEC CORP (JP) | 2000-08-02 | — | — | EP | claimed |
| US-5738975-A | MIXTURE CONTAINING (METH)ACRYLATE TERPOLYMER HAVING GROUP WHICH REACTS WITH AN ACID TO CONVERT POLARITY OF POLYMER, PHOTO ACID GENERATING COMPOUND, SOLVENT | NEC CORPORATION (JP) | 1998-04-14 | — | — | US | claimed |
| US-5621019-A | PHOTORESIST CONTAINING PHOTO ACID GENERATOR AND ULTRAVIOLET RADIATION TRANSPARENT ACRYLIC POLYMER HAVING BRIDGED CYCLOHYDROCARBON GROUP RESIDUE; RESOLUTION, DRY ETCH RESISTANCE | NEC CORPORATION (JP) | 1997-04-15 | — | — | US | claimed |
| CN-110850680-B | Curable composition, display element, and method for forming cured film | JSR株式会社 | 2024-10-25 | — | — | CN | disclosed |
| US-11681222-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2023-06-20 | — | — | US | disclosed |
| CN-107544208-B | Negative photosensitive resin composition, spacer, protective film and liquid crystal display element | 奇美实业股份有限公司 | 2022-05-31 | — | — | CN | disclosed |
| CN-108700835-B | Resist pattern forming method and resist | 日本瑞翁株式会社 | 2022-05-27 | — | — | CN | disclosed |
| US-20220137508-A9 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2022-05-05 | — | — | US | disclosed |
| CN-109415513-B | Silicon-rich silsesquioxane resins | 美国陶氏有机硅公司 | 2022-02-25 | — | — | CN | disclosed |
| US-20210278764-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2021-09-09 | — | — | US | disclosed |
| US-11036133-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2021-06-15 | — | — | US | disclosed |
| EP-0930541-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-07-21 | — | — | EP | disclosed |
| US-5866304-A | USING AN ACRYLATED ACID TERPOLYMER | NEC CORPORATION (JP) | 1999-02-02 | — | — | US | disclosed |
| EP-0849634-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-06-24 | — | — | EP | disclosed |
| US-5770346-A | BRIDGED CYCLIC HYDROCARBON GROUP-CONTAINING ACRYLATE POLYMER | NEC CORPORATION (JP) | 1998-06-23 | — | — | US | disclosed |
| US-5738975-A | MIXTURE CONTAINING (METH)ACRYLATE TERPOLYMER HAVING GROUP WHICH REACTS WITH AN ACID TO CONVERT POLARITY OF POLYMER, PHOTO ACID GENERATING COMPOUND, SOLVENT | NEC CORPORATION (JP) | 1998-04-14 | — | — | US | disclosed |
| US-5665518-A | CARBOXY-SUBSTITUTED, BRIDGED CARBOCYCLIC (METH)ACRYLATE DERIVATIVE MONOMERS; TRANSPARENCY, RESOLUTION, SOLUBILITY, AND DRY-ETCHING RESISTANCE; SEMICONDUCTORS | NEC CORPORATION (JP) | 1997-09-09 | — | — | US | disclosed |
| EP-0789278-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-08-13 | — | — | EP | disclosed |
| US-5621019-A | PHOTORESIST CONTAINING PHOTO ACID GENERATOR AND ULTRAVIOLET RADIATION TRANSPARENT ACRYLIC POLYMER HAVING BRIDGED CYCLOHYDROCARBON GROUP RESIDUE; RESOLUTION, DRY ETCH RESISTANCE | NEC CORPORATION (JP) | 1997-04-15 | — | — | US | disclosed |
| US-5585507-A | FINENESS PATTERNS | NEC CORPORATION (JP) | 1996-12-17 | — | — | US | disclosed |