SCHEMBL547409

SCHEMBL547409

O=C(OCCCCCCBr)C(F)(F)S(=O)(=O)OS(c1ccccc1)(c1ccccc1)c1ccc(F)cc1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 2/20 0.36
FKBP1A P62942 1/20 0.34
TDP1 Q9NUW8 1/20 0.33
TAS2R14 Q9NYV8 2/20 0.33
EGFR P00533 1/20 0.32
ERBB2 P04626 1/20 0.32
MEN1 O00255 2/20 0.32
KMT2A Q03164 2/20 0.32
GAA P10253 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
CA1 P00915 3/20 0.32
CA2 P00918 3/20 0.32
CA9 Q16790 3/20 0.32
CA12 O43570 2/20 0.32
PTPN1 P18031 1/20 0.31
CA4 P22748 1/20 0.31
CXCR4 P61073 1/20 0.31
ALDH1A1 P00352 1/20 0.31
POLB P06746 1/20 0.31
HDAC1 Q13547 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL546755 1.00 HSD11B1 (0.36) HSD11B1FKBP1ATDP1TAS2R14EGFR
SCHEMBL546351 1.00 HSD11B1 (0.36) HSD11B1FKBP1ATDP1TAS2R14EGFR
SCHEMBL546319 1.00 HSD11B1 (0.36) HSD11B1FKBP1ATDP1TAS2R14EGFR
SCHEMBL546323 1.00 HSD11B1 (0.36) HSD11B1FKBP1ATDP1TAS2R14EGFR
SCHEMBL547200 1.00 HSD11B1 (0.36) HSD11B1FKBP1ATDP1TAS2R14EGFR
SCHEMBL546858 1.00 HSD11B1 (0.36) HSD11B1FKBP1ATDP1TAS2R14EGFR
SCHEMBL546513 0.96 PTPN1 (0.34) HSD11B1MEN1KMT2ACA1CA2
SCHEMBL546562 0.96 PTPN1 (0.34) HSD11B1MEN1KMT2ACA1CA2
SCHEMBL546871 0.94 TDP1 (0.37) HSD11B1TDP1MEN1KMT2AGAA
SCHEMBL547444 0.94 TDP1 (0.37) HSD11B1TDP1MEN1KMT2AGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524440-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-03 US disclosed
US-8110336-B2 Resin and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-07 US disclosed
US-20110165513-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY LTD (JP) 2011-07-07 US disclosed
US-20100075257-A1 Resin and Chemically Amplified Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-25 US disclosed