SCHEMBL546562

SCHEMBL546562

O=C(OCCCCCCCCCCCCBr)C(F)(F)S(=O)(=O)OS(c1ccc(F)cc1)(c1ccc(F)cc1)c1ccc(F)cc1

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTPN1 P18031 1/20 0.34
CA1 P00915 4/20 0.32
CA2 P00918 4/20 0.32
CA12 O43570 3/20 0.32
CA9 Q16790 3/20 0.32
HSD11B1 P28845 1/20 0.32
MEN1 O00255 2/20 0.31
KMT2A Q03164 2/20 0.31
ALDH1A1 P00352 1/20 0.31
PKM P14618 1/20 0.31
ESR2 Q92731 1/20 0.31
ABCC9 O60706 1/20 0.30
ABCC8 Q09428 1/20 0.30
KCNJ11 Q14654 1/20 0.30
KCNJ8 Q15842 1/20 0.30
LMNA P02545 1/20 0.30
CA4 P22748 1/20 0.30
HDAC3 O15379 1/20 0.30
HDAC4 P56524 1/20 0.30
HDAC1 Q13547 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL546513 1.00 PTPN1 (0.34) PTPN1CA1CA2CA12CA9
SCHEMBL547200 0.96 HSD11B1 (0.36) PTPN1CA1CA2CA12CA9
SCHEMBL546755 0.96 HSD11B1 (0.36) PTPN1CA1CA2CA12CA9
SCHEMBL546319 0.96 HSD11B1 (0.36) PTPN1CA1CA2CA12CA9
SCHEMBL546323 0.96 HSD11B1 (0.36) PTPN1CA1CA2CA12CA9
SCHEMBL547409 0.96 HSD11B1 (0.36) PTPN1CA1CA2CA12CA9
SCHEMBL546351 0.96 HSD11B1 (0.36) PTPN1CA1CA2CA12CA9
SCHEMBL546858 0.96 HSD11B1 (0.36) PTPN1CA1CA2CA12CA9
SCHEMBL546741 0.94 KMT2A (0.38) MEN1KMT2AALDH1A1
SCHEMBL546394 0.89 NPSR1 (0.35) PTPN1CA1CA2CA12CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524440-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-03 US disclosed
US-8110336-B2 Resin and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-07 US disclosed
US-20110165513-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY LTD (JP) 2011-07-07 US disclosed
US-20100075257-A1 Resin and Chemically Amplified Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-25 US disclosed