Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 3/20 | 0.63 |
| ▸ | MAPT | P10636 | 4/20 | 0.59 |
| ▸ | GAA | P10253 | 3/20 | 0.59 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.59 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.59 |
| ▸ | LMNA | P02545 | 3/20 | 0.55 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.52 |
| ▸ | POLB | P06746 | 1/20 | 0.50 |
| ▸ | PKM | P14618 | 1/20 | 0.50 |
| ▸ | MEN1 | O00255 | 1/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.47 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.47 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.47 |
| ▸ | BACE1 | P56817 | 1/20 | 0.47 |
| ▸ | NPC1 | O15118 | 1/20 | 0.46 |
| ▸ | RAB9A | P51151 | 1/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.46 |
| ▸ | TSHR | P16473 | 2/20 | 0.45 |
| ▸ | HTT | P42858 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3190165 | 1.00 | ELANE (0.63) | ELANEMAPTGAAALDH1A1HSP90AA1 | |
| Bicarbonate SCHEMBL8461133 | 0.94 | ELANE (0.58) | ELANEMAPTGAAALDH1A1HSP90AA1 | |
| SCHEMBL2031544 | 0.93 | ELANE (0.56) | ELANEMAPTGAAALDH1A1HSP90AA1 | |
| SCHEMBL3209192 | 0.92 | LMNA (0.64) | ELANEMAPTGAAALDH1A1HSP90AA1 | |
| SCHEMBL10425843 | 0.87 | ELANE (0.58) | ELANEMAPTGAAALDH1A1HSP90AA1 | |
| Trifluoromethanesulfonic Acid SCHEMBL3421883 | 0.84 | MAPT (0.49) | ELANEMAPTGAAALDH1A1HSP90AA1 | |
| Acetic Acid Phenyl Ester SCHEMBL6422166 | 0.83 | ELANE (0.72) | ELANEMAPTGAAALDH1A1HSP90AA1 | |
| Acetic Acid Phenyl Ester SCHEMBL35500 | 0.83 | ELANE (0.72) | ELANEMAPTGAAALDH1A1HSP90AA1 | |
| SCHEMBL29745917 | 0.82 | ELANE (0.45) | ELANEMAPTGAAALDH1A1HSP90AA1 | |
| SCHEMBL29745998 | 0.82 | MAPT (0.46) | ELANEMAPTGAAALDH1A1HSP90AA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 474 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2026100410-A1 | IODINE-CONTAINING POLYMERIZABLE COMPOUND AND IODINE-CONTAINING POLYMER | 三菱瓦斯化学株式会社 | 2026-05-15 | — | — | WO | disclosed |
| US-20240210830-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-27 | — | — | US | disclosed |
| US-20240210830-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-27 | — | — | US | disclosed |
| US-11914291-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-11914294-B2 | Positive resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-11914294-B2 | Positive resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-20240027909-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027909-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-6190834-B1 | FIRST RESIN BEING AN EPOXY RESIN, AND A SECOND EPOXY RESIN HAVING AN N-SUBSTITUTED CARBAMIC ACID ESTER GROUP AND A RADICAL POLYMERIC UNSATURATED BOND IN ITS SIDE CHAIN | HITACHI, LTD. (JP) | 2001-02-20 | — | — | US | disclosed |
| US-6168898-B1 | A POSITIVE ACTING, PHOTOIMAGEABLE COMPOSITION HAVING, A PHOTOACID GENERATOR CAPABLE OF GENERATING AN ACID UPON EXPOSURE TO ACTINIC RADIATION, A STYRENE-MALEIC ANHYDRIDE COPOLYMER, AN EPXOY, AND A CURING CATALYST | ISOLA LAMINATE SYSTEMS CORP. | 2001-01-02 | — | — | US | disclosed |
| EP-1062545-A1 | POSITIVE ACTING PHOTODIELECTRIC COMPOSITION | Isola Laminate Systems Corporation (US) | 2000-12-27 | — | — | EP | disclosed |
| US-6120693-A | Method of manufacturing an interlayer via and a laminate precursor useful for same | ALLIEDSIGNAL INC. (US) | 2000-09-19 | — | — | US | disclosed |
| WO-2000028798-A1 | METHOD OF MANUFACTURING AN INTERLAYER VIA AND A LAMINATE PRECURSOR USEFUL FOR SAME | ALLIEDSIGNAL INC. (US) | 2000-05-18 | — | — | WO | disclosed |
| EP-0976307-A1 | POSITIVE WORKING PHOTODEFINABLE RESIN COATED METAL FOR MASS PRODUCTION OF MICROVIAS IN MULTILAYER PRINTED WIRING BOARDS | AlliedSignal Inc. (US) | 2000-02-02 | — | — | EP | disclosed |
| EP-0976308-A1 | FABRICATION OF HIGH DENSITY MULTILAYER INTERCONNECT PRINTED CIRCUIT BOARDS | AlliedSignal Inc. (US) | 2000-02-02 | — | — | EP | disclosed |
| WO-1999041642-A1 | POSITIVE ACTING PHOTODIELECTRIC COMPOSITION | ISOLA LAMINATE SYSTEMS CORPORATION (US) | 1999-08-19 | — | — | WO | disclosed |
| WO-1998047332-A1 | POSITIVE WORKING PHOTODEFINABLE RESIN COATED METAL FOR MASS PRODUCTION OF MICROVIAS IN MULTILAYER PRINTED WIRING BOARDS | ALLIEDSIGNAL INC. (US) | 1998-10-22 | — | — | WO | disclosed |
| WO-1998047333-A1 | FABRICATION OF HIGH DENSITY MULTILAYER INTERCONNECT PRINTED CIRCUIT BOARDS | ALLIEDSIGNAL INC. (US) | 1998-10-22 | — | — | WO | disclosed |