Sugi Predict

Sugi Predict / Compounds / SCHEMBL3190165

SCHEMBL3190165

SCHEMBL3190165

CC(=O)Oc1ccc([S+](c2ccccc2)c2ccc(OC(C)=O)cc2)cc1

nearest known ligand 0.63

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ELANE P08246 3/20 0.63
▸ MAPT P10636 4/20 0.59
▸ GAA P10253 3/20 0.59
▸ ALDH1A1 P00352 1/20 0.59
▸ HSP90AA1 P07900 1/20 0.59
▸ LMNA P02545 3/20 0.55
▸ HSD17B10 Q99714 2/20 0.52
▸ POLB P06746 1/20 0.50
▸ PKM P14618 1/20 0.50
▸ MEN1 O00255 1/20 0.50
▸ KMT2A Q03164 1/20 0.50
▸ TDP1 Q9NUW8 1/20 0.47
▸ NPSR1 Q6W5P4 1/20 0.47
▸ MAPK1 P28482 1/20 0.47
▸ BACE1 P56817 1/20 0.47
▸ NPC1 O15118 1/20 0.46
▸ RAB9A P51151 1/20 0.46
▸ SMN1; SMN2 Q16637 1/20 0.46
▸ TSHR P16473 2/20 0.45
▸ HTT P42858 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL547514 1.00 ELANE (0.63) ELANEMAPTGAAALDH1A1HSP90AA1
Bicarbonate SCHEMBL8461133 0.94 ELANE (0.58) ELANEMAPTGAAALDH1A1HSP90AA1
SCHEMBL2031544 0.93 ELANE (0.56) ELANEMAPTGAAALDH1A1HSP90AA1
SCHEMBL3209192 0.92 LMNA (0.64) ELANEMAPTGAAALDH1A1HSP90AA1
SCHEMBL10425843 0.87 ELANE (0.58) ELANEMAPTGAAALDH1A1HSP90AA1
Trifluoromethanesulfonic Acid SCHEMBL3421883 0.84 MAPT (0.49) ELANEMAPTGAAALDH1A1HSP90AA1
Acetic Acid Phenyl Ester SCHEMBL6422166 0.83 ELANE (0.72) ELANEMAPTGAAALDH1A1HSP90AA1
Acetic Acid Phenyl Ester SCHEMBL35500 0.83 ELANE (0.72) ELANEMAPTGAAALDH1A1HSP90AA1
SCHEMBL29745917 0.82 ELANE (0.45) ELANEMAPTGAAALDH1A1HSP90AA1
SCHEMBL29745998 0.82 MAPT (0.46) ELANEMAPTGAAALDH1A1HSP90AA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070111138-A1 Photoactive compounds MERCK PATENT GMBH (DE) 2007-05-17 — — US claimed
US-20180011401-A1 SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD TOYO GOSEI CO., LTD. (JP) 2018-01-11 — — US disclosed
US-9714217-B2 Sulfonic acid derivative and photoacid generator TOYO GOSEI CO., LTD. (JP) 2017-07-25 — — US disclosed
US-9146467-B2 Coating compositions MERCK PATENT GMBH (DE) 2015-09-29 — — US disclosed
US-20130236833-A1 COATING COMPOSITIONS AZ ELECTRONIC MATERIALS USA CORP. (US) 2013-09-12 — — US disclosed
US-8455176-B2 Coating composition AZ ELECTRONIC MATERIALS USA CORP. (US) 2013-06-04 — — US disclosed
US-20130130175-A1 Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method CENTRAL GLASS COMPANY, LIMITED (JP) 2013-05-23 — — US disclosed
US-8435717-B2 Compound for photoacid generator, resist composition using the same, and pattern-forming method CENTRAL GLASS COMPANY, LIMITED (JP) 2013-05-07 — — US disclosed
US-20120289738-A1 SULFONIC ACID DERIVATIVE AND PHOTOACID GENERATOR TOYO GOSEI CO., LTD. (JP) 2012-11-15 — — US disclosed
US-20100119972-A1 COATING COMPOSITION MERCK PATENT GMBH (DE) 2010-05-13 — — US disclosed
US-7678528-B2 Photoactive compounds AZ ELECTRONIC MATERIALS USA CORP. (US) 2010-03-16 — — US disclosed
US-20100035185-A1 Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method CENTRAL GLASS COMPANY, LTD. (JP) 2010-02-11 — — US disclosed
US-20080261147-A1 Photoactive Compounds RAHMAN M DALIL 2008-10-23 — — US disclosed
US-7414148-B2 Process for producing alkoxycarbonylfluoroalkanesulfonates CENTRAL GLASS COMPANY LIMITED (JP) 2008-08-19 — — US disclosed
US-20080108846-A1 PROCESS FOR PRODUCING ALKOXYCARBONYLFLUOROALKANESULFONATES CENTRAL GLASS COMPANY, LIMITED (JP) 2008-05-08 — — US disclosed
US-20080096127-A1 Photoactive Compounds RAHMAN M DALIL 2008-04-24 — — US disclosed
US-7358408-B2 Photoactive compounds AZ ELECTRONIC MATERIALS USA CORP. (US) 2008-04-15 — — US disclosed
US-20080058542-A1 Photoactive Compounds RAHMAN M D 2008-03-06 — — US disclosed
US-20070111138-A1 Photoactive compounds MERCK PATENT GMBH (DE) 2007-05-17 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20180011401-A1 SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD ASIC1, ASIC3, CRY1 ELANE 4761/4885MAPT 4292/4885GAA 3140/4885
US-20080108846-A1 PROCESS FOR PRODUCING ALKOXYCARBONYLFLUOROALKANESULFONATES ARSA, PFAS, MPST ELANE 2964/4885MAPT 4791/4885GAA 919/4885
US-20100035185-A1 Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method ASIC1, RER1, INSRR ELANE 3804/4885MAPT 4347/4885GAA 2581/4885
US-20120289738-A1 SULFONIC ACID DERIVATIVE AND PHOTOACID GENERATOR CRY1, ASIC1, ASIC3 ELANE 4246/4885MAPT 3875/4885GAA 3004/4885
US-20130130175-A1 Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method ASIC1, RER1, INSRR ELANE 3632/4885MAPT 4438/4885GAA 2532/4885
US-20100119972-A1 COATING COMPOSITION S100A9, CAPG, C5 ELANE 2119/4885MAPT 488/4885GAA 2654/4885
US-20080058542-A1 Photoactive Compounds CRY1, CRY2, PPOX ELANE 2081/4885MAPT 99/4885GAA 2228/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.