SCHEMBL5481945

SCHEMBL5481945

COCCC(=O)OCC(C)O

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.56
ADRA2A P08913 1/20 0.39
ADRA1A P35348 1/20 0.39
BLM P54132 1/20 0.38
LMNA P02545 2/20 0.37
KDM4E B2RXH2 1/20 0.37
DUSP3 P51452 1/20 0.37
MEN1 O00255 1/20 0.37
KMT2A Q03164 1/20 0.37
ENPP2 Q13822 5/20 0.36
LPAR6 P43657 1/20 0.36
LPAR1 Q92633 1/20 0.36
LPAR4 Q99677 1/20 0.36
LPAR5 Q9H1C0 1/20 0.36
LPAR2 Q9HBW0 1/20 0.36
LPAR3 Q9UBY5 1/20 0.36
HSD17B10 Q99714 1/20 0.35
PRKCA P17252 1/20 0.35
PRKCE Q02156 1/20 0.35
PRKCQ Q04759 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20210567 0.85 TSHR (0.42) MAPTADRA2AADRA1ALMNAENPP2
SCHEMBL822396 0.84 MAPT (0.67) MAPTADRA2AADRA1ABLMLMNA
SCHEMBL31106103 0.84 MAPT (0.41) MAPTLMNAKDM4EDUSP3MEN1
SCHEMBL822246 0.80 MAPT (0.74) MAPTLMNAKDM4EDUSP3MEN1
SCHEMBL821850 0.80 MAPT (0.81) MAPTLMNAKDM4EDUSP3MEN1
Methoxymethane SCHEMBL19666686 0.79 MAPT (0.67) MAPTLMNAKDM4EDUSP3MEN1
SCHEMBL633254 0.78 MAPT (0.50) MAPTLMNAKDM4EDUSP3MEN1
SCHEMBL821851 0.78 MAPT (0.85) MAPTLMNAKDM4EDUSP3MEN1
SCHEMBL822254 0.78 MAPT (0.85) MAPTLMNAKDM4EDUSP3MEN1
SCHEMBL821856 0.78 MAPT (0.85) MAPTLMNAKDM4EDUSP3MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9672858-B2 Magnetic recording medium manufacturing method KABUSHIKI KAISHA TOSHIBA (JP) 2017-06-06 US disclosed
US-20160027462-A1 MAGNETIC RECORDING MEDIUM MANUFACTURING METHOD KABUSHIKI KAISHA TOSHIBA (JP) 2016-01-28 US disclosed
US-8492499-B2 Addition compounds as dispersants and dispersion stabilizers BYK-CHEMIE GMBH (DE) 2013-07-23 US disclosed
US-20070259120-A1 Addition compounds as dispersants and dispersion stabilizers BYK-CHEMIE GMBH (DE) 2007-11-08 US disclosed
US-7005216-B2 Photo mask RENESAS TECHNOLOGY CORP. (JP) 2006-02-28 US disclosed
US-20030129505-A1 Krypton fluoride laser lithography; photoresist pattern RENESAS ELECTRONICS CORPORATION (JP) 2003-07-10 US disclosed