Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.50 |
| ▸ | CYP3A4 | P08684 | 4/20 | 0.50 |
| ▸ | CA12 | O43570 | 2/20 | 0.50 |
| ▸ | CA2 | P00918 | 2/20 | 0.50 |
| ▸ | CA9 | Q16790 | 2/20 | 0.50 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.50 |
| ▸ | LMNA | P02545 | 1/20 | 0.50 |
| ▸ | CA5A | P35218 | 1/20 | 0.50 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.50 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.50 |
| ▸ | ESR1 | P03372 | 3/20 | 0.48 |
| ▸ | ESR2 | Q92731 | 3/20 | 0.48 |
| ▸ | ACHE | P22303 | 2/20 | 0.46 |
| ▸ | HSD17B1 | P14061 | 3/20 | 0.42 |
| ▸ | HSD17B2 | P37059 | 3/20 | 0.42 |
| ▸ | GABRA1 | P14867 | 2/20 | 0.42 |
| ▸ | GABRB2 | P47870 | 2/20 | 0.42 |
| ▸ | TSHR | P16473 | 2/20 | 0.41 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.41 |
| ▸ | CA1 | P00915 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29381143 | 1.00 | ALDH1A1 (0.50) | ALDH1A1CYP3A4CA12CA2CA9 | |
| SCHEMBL27479317 | 0.98 | ALDH1A1 (0.48) | ALDH1A1CYP3A4CA12CA2CA9 | |
| SCHEMBL29943758 | 0.86 | ALDH1A1 (0.50) | ALDH1A1CYP3A4CA12CA2CA9 | |
| SCHEMBL304190 | 0.85 | ESR1 (0.50) | ALDH1A1CYP3A4CA2ESR1ESR2 | |
| SCHEMBL31284901 | 0.83 | ESR1 (0.68) | ALDH1A1CYP3A4CA12CA2CA9 | |
| SCHEMBL1492513 | 0.83 | ESR1 (0.68) | ALDH1A1CYP3A4CA12CA2CA9 | |
| SCHEMBL2957052 | 0.83 | ESR1 (0.54) | ALDH1A1CYP3A4CA12CA2CA9 | |
| SCHEMBL29427097 | 0.83 | HDAC4 (0.57) | ALDH1A1CYP3A4CA12CA2CA9 | |
| SCHEMBL50933 | 0.83 | HDAC4 (0.57) | ALDH1A1CYP3A4CA12CA2CA9 | |
| SCHEMBL3716241 | 0.82 | ACHE (0.48) | ALDH1A1CYP3A4CA12CA2CA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 224 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113786287-B | Paper diaper and preparation method thereof | 福建恒安集团有限公司 | 2022-07-05 | — | — | CN | claimed |
| CN-113786287-A | Paper diaper and preparation method thereof | 福建恒安集团有限公司 | 2021-12-14 | — | — | CN | claimed |
| EP-1023263-B1 | NOVEL VITAMIN D ANALOGUES | LEO PHARM PROD LTD (DK) | 2002-06-12 | — | — | EP | claimed |
| EP-0327361-B1 | 3-(2-HYDROPEROXY-2-PROPYL)PHENOL AND METHOD OF PRODUCING RESORCINOL USING THE SAME | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1993-03-17 | — | — | EP | claimed |
| EP-0327361-A1 | 3-(2-hydroperoxy-2-propyl)phenol and method of producing resorcinol using the same | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1989-08-09 | — | — | EP | claimed |
| US-4460800-A | Process for preparation of hydroxyaryldialkylcarbinols | GENERAL ELECTRIC COMPANY (US) | 1984-07-17 | — | — | US | claimed |
| US-4460798-A | Process for preparation of asymmetrical bisphenols | GENERAL ELECTRIC COMPANY (US) | 1984-07-17 | — | — | US | claimed |
| JP-1199926-A | — | — | None | — | — | JP | disclosed |
| US-11852970-B2 | Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-12-26 | — | — | US | disclosed |
| US-20230244142-A1 | POLYMER, RESIST COMPOSITION, AND PATTERN FORMING METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-03 | — | — | US | disclosed |
| US-20230244142-A1 | POLYMER, RESIST COMPOSITION, AND PATTERN FORMING METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-03 | — | — | US | disclosed |
| US-11572430-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-02-07 | — | — | US | disclosed |
| CN-113786287-B | Paper diaper and preparation method thereof | 福建恒安集团有限公司 | 2022-07-05 | — | — | CN | disclosed |
| EP-0021848-B1 | PROCESS AND APPARATUS FOR THE PREPARATION OF PHENOLS | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1983-04-13 | — | — | EP | disclosed |
| US-4334108-A | Process and apparatus for preparation of phenols | MITSU PETROCHEMICAL INDUSTRIES LTD. (JP) | 1982-06-08 | — | — | US | disclosed |
| US-4273623-A | ACID DECOMPOSITION OF M-DIISOPROPYLBENZENE HYDROPEROXIDE IN INERT SOLVENT IN THE PRESENCE OF AN ACID CATALYST | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1981-06-16 | — | — | US | disclosed |
| US-4260831-A | Oligomerization of m-isopropenylphenol | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1981-04-07 | — | — | US | disclosed |
| EP-0021848-A1 | Process and apparatus for the preparation of phenols | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1981-01-07 | — | — | EP | disclosed |
| US-4239918-A | Meta, para-substituted isopropylidene bisphenols and methods for making | GENERAL ELECTRIC COMPANY (US) | 1980-12-16 | — | — | US | disclosed |
| US-4239918-A | Meta, para-substituted isopropylidene bisphenols and methods for making | GENERAL ELECTRIC COMPANY (US) | 1980-12-16 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11852970-B2 | Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin | SLC39A11, CROCC, TERB1 | ALDH1A1 3830/4885CYP3A4 3096/4885CA12 2546/4885 |
| US-11572430-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | C9, C5, C1R | ALDH1A1 1540/4885CYP3A4 1754/4885CA12 1606/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.