Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 1/20 | 0.40 |
| ▸ | KDM1A | O60341 | 1/20 | 0.39 |
| ▸ | SLC6A3 | Q01959 | 4/20 | 0.35 |
| ▸ | SLC6A4 | P31645 | 3/20 | 0.34 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.33 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.33 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL654652 | 0.72 | SLC6A3 (0.40) | SLC6A3SLC6A4CHRM2CHRM1CHRM3 | |
| SCHEMBL4055221 | 0.70 | ELANE (0.60) | ELANEKDM1A | |
| SCHEMBL4243811 | 0.68 | — | — | |
| SCHEMBL8047311 | 0.65 | CHRM2 (0.39) | SLC6A3CHRM2CHRM1CHRM3KDM4E | |
| SCHEMBL15389790 | 0.65 | CHRM2 (0.39) | SLC6A3CHRM2CHRM1CHRM3KDM4E | |
| SCHEMBL2223556 | 0.65 | ELANE (0.52) | ELANEKDM1A | |
| SCHEMBL4061370 | 0.64 | ELANE (0.81) | ELANEKDM1A | |
| SCHEMBL24364213 | 0.64 | KDM4E (0.41) | ELANECHRM2CHRM1CHRM3KDM4E | |
| SCHEMBL7710765 | 0.64 | ELANE (0.34) | ELANEKDM1A | |
| SCHEMBL16593714 | 0.63 | SLC6A3 (0.31) | SLC6A3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7192682-B2 | Unsaturated monomers, polymers, chemically-amplified resist composition, and process of pattern formation | NEC CORPORATION (JP) | 2007-03-20 | — | — | US | disclosed |
| US-20040265732-A1 | Unsaturated monomers, polymers, chemically amplified resist composition, and process of pattern formation | NEC CORPORATION (JP) | 2004-12-30 | — | — | US | disclosed |