Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A3 | Q01959 | 4/20 | 0.40 |
| ▸ | SLC6A4 | P31645 | 3/20 | 0.38 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.34 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.34 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.34 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.32 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | BTK | Q06187 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11239464 | 0.81 | SLC6A3 (0.53) | SLC6A3SLC6A4KMT2A | |
| SCHEMBL11245895 | 0.79 | SLC6A3 (0.40) | SLC6A3SLC6A4ALOX15KDM4EMEN1 | |
| SCHEMBL11244400 | 0.77 | SLC6A3 (0.39) | SLC6A3SLC6A4ALOX15KDM4EMEN1 | |
| SCHEMBL8047311 | 0.75 | CHRM2 (0.39) | SLC6A3CHRM2CHRM1CHRM3ALOX15 | |
| SCHEMBL15389790 | 0.75 | CHRM2 (0.39) | SLC6A3CHRM2CHRM1CHRM3ALOX15 | |
| SCHEMBL384569 | 0.72 | SLC6A3 (0.39) | SLC6A3SLC6A4GAA | |
| SCHEMBL5483652 | 0.72 | ELANE (0.40) | SLC6A3SLC6A4CHRM2CHRM1CHRM3 | |
| SCHEMBL24364213 | 0.66 | KDM4E (0.41) | CHRM2CHRM1CHRM3NR1H2KDM4E | |
| SCHEMBL511962 | 0.66 | HSD11B1 (0.34) | SLC6A3CHRM2CHRM1CHRM3ALOX15 | |
| SCHEMBL7118122 | 0.66 | CHRM2 (0.33) | SLC6A3SLC6A4CHRM2CHRM1CHRM3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20150183912-A1 | (METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVING LACTONE STRUCTURE, AND METHOD FOR FORMING PATTERN BY USING IT | NEC CORPORATION (JP) | 2015-07-02 | — | — | US | disclosed |
| US-8969483-B2 | (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it | NEC CORPORATION (JP) | 2015-03-03 | — | — | US | disclosed |
| US-8802783-B2 | — | — | 2014-08-12 | — | — | US | disclosed |
| US-8802798-B2 | (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it | NEC CORPORATION (JP) | 2014-08-12 | — | — | US | disclosed |
| US-20130122419-A1 | (METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVING LACTONE STRUCTURE, AND METHOD FOR FORMING PATTERN BY USING IT | NEC CORPORATION (JP) | 2013-05-16 | — | — | US | disclosed |
| US-20120178023-A1 | (METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVING LACTONE STRUCTURE, AND METHOD FOR FORMING PATTERN BY USING IT | NEC CORPORATION | 2012-07-12 | — | — | US | disclosed |
| US-8119751-B2 | — | — | 2012-02-21 | — | — | US | disclosed |
| US-20110196122-A1 | (METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVING LACTONE STRUCTURE, AND METHOD FOR FORMING PATTERN BY USING IT | NEC CORPORATION | 2011-08-11 | — | — | US | disclosed |
| US-20090023878-A1 | (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it | NEC CORPORATION | 2009-01-22 | — | — | US | disclosed |
| US-7432035-B2 | (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it | NEC CORPORATION (JP) | 2008-10-07 | — | — | US | disclosed |
| US-20070218403-A1 | (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it | NEC CORPORATION | 2007-09-20 | — | — | US | disclosed |
| US-7186495-B2 | (Meth) acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it | NEC CORPORATION (JP) | 2007-03-06 | — | — | US | disclosed |
| US-6469197-B1 | A (METH)ACRYLATE DERIVATIVE WHOSE ESTER PORTION IS A 4,7-METHANOINDENE DIOL OR 1,4:5,8-DIMETHANONAPHTHALENE DIOL FOR MAKING PHOTORESIST POLYMERS | NEC CORPORATION (JP) | 2002-10-22 | — | — | US | disclosed |
| US-20010026901-A1 | (Meth) acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it | NEC CORPORATION (JP) | 2001-10-04 | — | — | US | disclosed |
| US-6146806-A | Negative photoresist composition using polymer having 1,2-diol structure and process for forming pattern using the same | NEC CORPORATION (JP) | 2000-11-14 | — | — | US | disclosed |