SCHEMBL5484523

SCHEMBL5484523

CCCCP(=O)(OC)c1ccccc1C

nearest known ligand 0.43

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.43
CETP P11597 3/20 0.36
HIF1A Q16665 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5485667 0.90 L3MBTL1 (0.36) TSHRCETP
SCHEMBL5488667 0.85 TSHR (0.42) TSHRCETP
SCHEMBL5486866 0.84 MEN1 (0.44) TSHRCETP
SCHEMBL5488594 0.84 TSHR (0.41) TSHR
SCHEMBL5486344 0.82 UTRN (0.44) TSHR
SCHEMBL777617 0.82 TSHR (0.42) TSHRCETP
SCHEMBL1725978 0.79 TSHR (0.60) TSHRCETPHIF1A
SCHEMBL11657297 0.78 TSHR (0.53) TSHR
SCHEMBL5485687 0.78 CYP3A4 (0.40) HIF1A
SCHEMBL778109 0.77 AOX1 (0.46) TSHRCETP

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070087270-A1 NONAQUEOUS ELECTROLYTE SOLUTION AND NONAQUEOUS ELECTROLYTE SOLUTION SECONDARY BATTERY EMPLOYING THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2007-04-19 US disclosed
US-7169511-B2 Nonaqueous electrolyte solution and nonaqueous electrolyte solution secondary battery employing the same MITSUBISHI CHEMICAL CORPORATION (JP) 2007-01-30 US disclosed
EP-1555711-A1 NONAQUEOUS ELECTROLYTIC SOLUTION AND NONAQUEOUS ELECTROLYTE SECONDARY BATTERY CONTAINING THE SAME Mitsubishi Chemical Corporation (JP) 2005-07-20 EP disclosed
US-20050014071-A1 Nonaqueous electrolyte solution and nonaqueous electrolyte solution secondary battery employing the same MITSUBISHI CHEMICAL CORPORATION (JP) 2005-01-20 US disclosed