SCHEMBL5485054

SCHEMBL5485054

Cl[Si](Cl)(Cl)c1ccc(Oc2ccccc2)cc1

nearest known ligand 0.57

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 8/20 0.57
TSHR P16473 1/20 0.57
NR1H2 P55055 1/20 0.50
BAX Q07812 1/20 0.50
MAOA P21397 1/20 0.50
CA1 P00915 2/20 0.45
CA2 P00918 2/20 0.45
GSTP1 P09211 1/20 0.42
SOS1 Q07889 1/20 0.42
CA9 Q16790 1/20 0.42
PARP10 Q53GL7 1/20 0.42
PLA2G2A P14555 1/20 0.42
NPC1 O15118 2/20 0.41
RAB9A P51151 2/20 0.41
SCN4A P35499 1/20 0.41
MEN1 O00255 1/20 0.41
KMT2A Q03164 1/20 0.41
NLRP3 Q96P20 1/20 0.41
SRD5A2 P31213 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10319919 0.84 LTA4H (0.55) LTA4HTSHRNR1H2BAXMAOA
SCHEMBL10319647 0.82 LTA4H (0.52) LTA4HTSHRNR1H2BAXMAOA
SCHEMBL27660935 0.80 LTA4H (0.50) LTA4HTSHRNR1H2BAXMAOA
SCHEMBL10317741 0.80 LTA4H (0.50) LTA4HTSHRNR1H2BAXMAOA
SCHEMBL3893562 0.79 LTA4H (0.92) LTA4HTSHRNR1H2BAXMAOA
SCHEMBL11576945 0.79 LTA4H (0.92) LTA4HTSHRNR1H2BAXMAOA
SCHEMBL435149 0.79 LTA4H (0.92) LTA4HTSHRNR1H2BAXMAOA
SCHEMBL122719 0.79 LTA4H (0.92) LTA4HTSHRNR1H2BAXMAOA
SCHEMBL22129853 0.79 LTA4H (0.92) LTA4HTSHRNR1H2BAXMAOA
SCHEMBL9212518 0.79 LTA4H (0.92) LTA4HTSHRNR1H2BAXMAOA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7291747-B2 Silicon compounds and process for preparation thereof CHISSO CORPORATION (JP) 2007-11-06 US disclosed
US-20040143081-A1 Novel silicon compounds and process for preparation thereof JNC CORPORATION (JP) 2004-07-22 US disclosed