⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5488203 | 0.88 | — | — | |
| Toluene SCHEMBL28145641 | 0.83 | TSHR (0.44) | — | |
| SCHEMBL599315 | 0.83 | — | — | |
| SCHEMBL4328369 | 0.82 | TSHR (0.34) | — | |
| SCHEMBL6037078 | 0.82 | TSHR (0.34) | — | |
| SCHEMBL17082 | 0.81 | — | — | |
| SCHEMBL115208 | 0.78 | — | — | |
| SCHEMBL3065380 | 0.78 | — | — | |
| SCHEMBL16401966 | 0.78 | — | — | |
| SCHEMBL6050879 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7270849-B2 | Organic siloxane copolymer film, method and deposition apparatus for producing same, and semiconductor device using such copolymer film | NEC CORPORATION (JP) | 2007-09-18 | — | — | US | disclosed |
| US-20070157884-A1 | ORGANOSILOXANE COPOLYMER FILM, PRODUCTION METHOD AND DEPOSITION APPARATUS FOR SAID COPOLYMER FILM, AND SEMICONDUCTOR DEVICE USING SAID COPOLYMER FILM | NEC CORPORATION (JP) | 2007-07-12 | — | — | US | disclosed |
| US-20050267253-A1 | Organic siloxane copolymer film, method and deposition apparatus for producing same, and semiconductor device using such copolymer film | GODO KAISHA IP BRIDGE 1 (JP) | 2005-12-01 | — | — | US | disclosed |