SCHEMBL5486477

SCHEMBL5486477

Cc1cccc(C[Si](Cl)(Cl)Cl)c1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TAAR1 Q96RJ0 2/20 0.50
IDO1 P14902 2/20 0.48
ACHE P22303 1/20 0.46
CYP11B1 P15538 2/20 0.43
CYP11B2 P19099 2/20 0.43
ALDH1A1 P00352 3/20 0.42
TDP1 Q9NUW8 1/20 0.42
HRH3 Q9Y5N1 1/20 0.42
MAOB P27338 1/20 0.41
LMNA P02545 1/20 0.41
CYP1A2 P05177 1/20 0.41
CYP3A4 P08684 1/20 0.41
CYP2C19 P33261 1/20 0.41
HTT P42858 1/20 0.41
NPSR1 Q6W5P4 1/20 0.41
KCNN3 Q9UGI6 1/20 0.40
TP53 P04637 1/20 0.40
POLB P06746 1/20 0.40
MAPT P10636 1/20 0.40
CTBP2 P56545 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4447466 0.84 KMT2A (0.36) TAAR1IDO1ALDH1A1LMNACYP1A2
SCHEMBL7754170 0.80 TAAR1 (0.52) TAAR1IDO1ACHECYP11B1CYP11B2
SCHEMBL5488915 0.79 TAAR1 (0.57) TAAR1IDO1ACHECYP11B1CYP11B2
SCHEMBL16621914 0.77 TAAR1 (0.48) TAAR1IDO1ACHECYP11B1CYP11B2
SCHEMBL5488290 0.77 CYP11B1 (0.36) CYP11B1CYP11B2ALDH1A1LMNAHTT
SCHEMBL2819082 0.76 TAAR1 (0.52) TAAR1IDO1ACHECYP11B1CYP11B2
SCHEMBL13027235 0.75 IDO1 (0.50) TAAR1IDO1ACHECYP11B1CYP11B2
SCHEMBL52147 0.75
SCHEMBL30084583 0.75
SCHEMBL29596752 0.74 TAAR1 (0.74) TAAR1IDO1ACHEHRH3MAOB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7291747-B2 Silicon compounds and process for preparation thereof CHISSO CORPORATION (JP) 2007-11-06 US disclosed
US-20040143081-A1 Novel silicon compounds and process for preparation thereof JNC CORPORATION (JP) 2004-07-22 US disclosed