Ether

Ether

SCHEMBL5486838

CCOCC.CN(C)C

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ether SCHEMBL4525310 1.00 ALDH1A1 (0.39)
Ether SCHEMBL7076490 0.96 ALDH1A1 (0.37)
Ether SCHEMBL8743889 0.96 ALDH1A1 (0.37)
Ether SCHEMBL27789726 0.96 ALDH1A1 (0.37)
Ether SCHEMBL5871078 0.96 ALDH1A1 (0.37)
Ether SCHEMBL6 0.85
Ether SCHEMBL9248674 0.85 ALDH1A1 (0.47)
Ether SCHEMBL21406 0.85 ALDH1A1 (0.47)
Ether SCHEMBL8160191 0.85 ALDH1A1 (0.47)
Ether SCHEMBL9248046 0.85 ALDH1A1 (0.47)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1738792-B Process for preparing gamma-cyhalothrin SYNGENTA LTD 2010-05-05 CN claimed
CN-1738792-A Process for preparing gamma-cyhalothrin SYNGENTA LTD (GB) 2006-02-22 CN claimed
EP-3684898-A1 ACTIVE SUBSTANCE WAFER Symrise AG (DE) 2020-07-29 EP disclosed
CN-110419002-A Photosensitive resin composition, color filter prepared using the same, and image display device DONGWOO FINE CHEM CO LTD 2019-11-05 CN disclosed
CN-110244512-A Red sensitive resin combination and colored filter comprising the composition 东友精细化工有限公司 2019-09-17 CN disclosed
CN-110032042-A Negative photoresist composition and its application method for laser ablation AZ电子材料卢森堡有限公司 2019-07-19 CN disclosed
WO-2019057294-A1 ACTIVE SUBSTANCE WAFER SYMRISE AG (DE) 2019-03-28 WO disclosed
CN-109071947-A Composition for organic electronic device sealant and the sealant using its formation 莫门蒂夫性能材料韩国株式会社 2018-12-21 CN disclosed
CN-108139670-A Negative photoresist composition for laser ablation and method of use thereof AZ电子材料卢森堡有限公司 2018-06-08 CN disclosed
CN-107817652-A Photosensitive polymer combination and the photocuring pattern being produced from it 东友精细化工有限公司 2018-03-20 CN disclosed
CN-107674089-A Carbazole derivates, the light trigger and Photocurable composition for including it 东友精细化工有限公司 2018-02-09 CN disclosed
CN-1738792-A Process for preparing gamma-cyhalothrin SYNGENTA LTD (GB) 2006-02-22 CN disclosed
US-20050277768-A1 Hydrophobic starch derivatives COOPERATIEVE VERKOOP-EN PRODUCTIEVERENIGING VAN AARDAPPELMEEL EN DERIVATEN AVEBE B.A. 2005-12-15 US disclosed
CN-1522685-A Ready-to-use bleaching compositions, preparation process thereof and bleaching process therewith �ź㴫 2004-08-25 CN disclosed
CN-1522686-A Ready-to-use bleaching compositions, preparation process thereof and bleaching process therewith 莱雅公司 2004-08-25 CN disclosed
CN-1262677-A Preparation of fused polycyclic alkaloids by ring closure of azomethine ylides, novel compounds thereof and their use as chemotherapeutic agents UNIV AUSTRALIAN (AU) 2000-08-09 CN disclosed
CN-1045791-C Lubricating oil containing aromatic ether compound MITSUI PETROCHEMICAL IND (JP) 1999-10-20 CN disclosed
CN-1130398-A Lubricating oil containing aromatic ether compound MITSUI PETROCHEMICAL IND (JP) 1996-09-04 CN disclosed
CN-1099409-A Non-hydrogen evolving siloxane-based lubricant composition KHONE POULENC SPECIAL CHEMICCO (US) 1995-03-01 CN disclosed
US-4971784-A DETERGENTS, ANTISEPTICS, BACTERICIDES, FUNGICIDES WELLA AKTIENGESELLSCHAFT (DE) 1990-11-20 US disclosed