SCHEMBL548710

SCHEMBL548710

O=Cc1cccc2cc3cc4cc5ccccc5cc4cc3cc12

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 8/20 0.49
KMT2A Q03164 5/20 0.49
MEN1 O00255 4/20 0.49
CYP1A2 P05177 3/20 0.49
MAPT P10636 2/20 0.49
NPSR1 Q6W5P4 2/20 0.49
MITF O75030 1/20 0.49
CYP2C9 P11712 1/20 0.49
PKM P14618 1/20 0.49
MAPK1 P28482 1/20 0.49
RAB9A P51151 1/20 0.49
CCR6 P51684 1/20 0.49
LMNA P02545 2/20 0.48
TDP1 Q9NUW8 2/20 0.48
THRB P10828 1/20 0.48
BLM P54132 1/20 0.48
GAA P10253 3/20 0.44
KDM4E B2RXH2 3/20 0.44
CYP2A6 P11509 1/20 0.41
ERN1 O75460 2/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL548781 1.00 ALDH1A1 (0.49) ALDH1A1KMT2AMEN1CYP1A2MAPT
SCHEMBL30446471 1.00 ALDH1A1 (0.49) ALDH1A1KMT2AMEN1CYP1A2MAPT
SCHEMBL31340003 1.00 ALDH1A1 (0.49) ALDH1A1KMT2AMEN1CYP1A2MAPT
SCHEMBL39718 0.98 ALDH1A1 (0.50) ALDH1A1KMT2AMEN1CYP1A2MAPT
SCHEMBL29392367 0.98 ALDH1A1 (0.50) ALDH1A1KMT2AMEN1CYP1A2MAPT
Methyl Alcohol SCHEMBL27597852 0.92 ALDH1A1 (0.46) ALDH1A1KMT2AMEN1CYP1A2MAPT
SCHEMBL1817898 0.89 MEN1 (0.48) ALDH1A1KMT2AMEN1CYP1A2MAPT
SCHEMBL17422067 0.87 ALDH1A1 (0.40) ALDH1A1KMT2AMEN1CYP1A2MAPT
Thiophene SCHEMBL27888073 0.87 ALDH1A1 (0.43) ALDH1A1KMT2AMEN1CYP1A2MAPT
SCHEMBL17422071 0.87 ALDH1A1 (0.40) ALDH1A1KMT2AMEN1CYP1A2MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115395000-A Composite positive electrode material, preparation method thereof, positive plate and battery 星恒电源股份有限公司 2022-11-25 CN disclosed
CN-115148982-A Composite positive electrode material, preparation method thereof, positive plate and battery 星恒电源股份有限公司 2022-10-04 CN disclosed
EP-2080750-B1 RADIATION-SENSITIVE COMPOSITION MITSUBISHI GAS CHEMICAL CO (JP) 2020-07-29 EP disclosed
US-9897913-B2 Radiation-sensitive composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2018-02-20 US disclosed
EP-1739485-B1 RESIST COMPOSITION MITSUBISHI GAS CHEMICAL CO (JP) 2016-08-31 EP disclosed
US-20150030980-A1 RADIATION-SENSITIVE COMPOSITION MITSUBISHI GAS CHEMICAL CO (JP) 2015-01-29 US disclosed
US-8846292-B2 Radiation-sensitive composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-09-30 US disclosed
CN-102507659-B Methanol gas sensor based on organic filter transistor and preparation method of methanol gas sensor UNIV ELECTRONIC SCIENCE & TECH 2013-11-13 CN disclosed
US-20120171379-A1 RADIATION-SENSITIVE COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2012-07-05 US disclosed
CN-102507659-A Methanol gas sensor based on organic filter transistor and preparation method of methanol gas sensor UNIV ELECTRONIC SCIENCE & TECH 2012-06-20 CN disclosed
US-8110334-B2 Radiation-sensitive composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2012-02-07 US disclosed
US-7871751-B2 Resist composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2011-01-18 US disclosed
US-20100047709-A1 RADIATION-SENSITIVE COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2010-02-25 US disclosed
EP-2080750-A1 RADIATION-SENSITIVE COMPOSITION Mitsubishi Gas Chemical Company, Inc. (JP) 2009-07-22 EP disclosed
US-20080153031-A1 Resist composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2008-06-26 US disclosed
US-20070059632-A1 Method of manufacturing a semiconductor device MITSUBISHI GAS CHEMICAL CO., INC. (JP) 2007-03-15 US disclosed
EP-1739485-A1 RESIST COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2007-01-03 EP disclosed
CN-1853141-A Compound for resist and radiation-sensitive composition MITSUBISHI GAS CHEMICAL CO (JP) 2006-10-25 CN disclosed
EP-1666970-A1 COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2006-06-07 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120171379-A1 RADIATION-SENSITIVE COMPOSITION PARG, RAD51, SRMS ALDH1A1 4594/4885KMT2A 1479/4885MEN1 1441/4885
US-20100047709-A1 RADIATION-SENSITIVE COMPOSITION C1S, C9, RAD51 ALDH1A1 1078/4885KMT2A 645/4885MEN1 1910/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.