⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5405593 | 0.78 | GRIN2D (0.41) | — | |
| SCHEMBL6346177 | 0.77 | — | — | |
| SCHEMBL1116036 | 0.71 | MEN1 (0.30) | — | |
| SCHEMBL22412156 | 0.71 | — | — | |
| SCHEMBL892133 | 0.70 | — | — | |
| SCHEMBL3612425 | 0.66 | GRIN2D (0.36) | — | |
| SCHEMBL246184 | 0.62 | — | — | |
| SCHEMBL6337494 | 0.62 | — | — | |
| SCHEMBL65160 | 0.62 | — | — | |
| SCHEMBL1278877 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7276323-B2 | Photoresists, polymers and processes for microlithography | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-10-02 | — | — | US | disclosed |
| EP-1131677-B1 | PHOTORESISTS, POLYMERS AND PROCESSES FOR MICROLITHOGRAPHY | DU PONT (US) | 2005-08-03 | — | — | EP | disclosed |
| US-6849377-B2 | Photoresists, polymers and processes for microlithography | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2005-02-01 | — | — | US | disclosed |
| US-20040023150-A1 | Photoresists, polymers and processes for microlithography | E. I. DU PONT DE NEMOURS AND COMPANY | 2004-02-05 | — | — | US | disclosed |
| US-20040023152-A1 | Photoresists, polymers and processes for microlithography | DUPONT ELECTRONICS, INC. | 2004-02-05 | — | — | US | disclosed |
| US-6593058-B1 | Fluorine-containing copolymer contains sufficient functionality to render the photoresist developable so as to produce a relief image, following imagewise exposure to ultraviolet radiation | E. I. DU PONT DE NEMOURS AND COMPANY | 2003-07-15 | — | — | US | disclosed |
| EP-1246013-A2 | Photoresists, polymers and processes for microlithography | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2002-10-02 | — | — | EP | disclosed |
| EP-1131677-A1 | PHOTORESISTS, POLYMERS AND PROCESSES FOR MICROLITHOGRAPHY | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2001-09-12 | — | — | EP | disclosed |
| WO-2000017712-A1 | PHOTORESISTS, POLYMERS AND PROCESSES FOR MICROLITHOGRAPHY | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2000-03-30 | — | — | WO | disclosed |