SCHEMBL5488318

SCHEMBL5488318

N#Cc1c(Cl)c(Cl)[c]c(Cl)c1Cl

nearest known ligand 0.55

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.55
ALDH1A1 P00352 1/20 0.55
TP53 P04637 1/20 0.55
CYP3A4 P08684 1/20 0.55
MAPT P10636 1/20 0.55
HPGD P15428 1/20 0.55
MAPK1 P28482 1/20 0.55
KMT2A Q03164 1/20 0.55
SMN1; SMN2 Q16637 1/20 0.55
KDM4E B2RXH2 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9115923 0.85 MEN1 (0.46) MEN1ALDH1A1TP53CYP3A4MAPT
SCHEMBL11322706 0.77 MEN1 (0.86) MEN1ALDH1A1TP53CYP3A4MAPT
SCHEMBL1033734 0.77 MEN1 (0.86) MEN1ALDH1A1TP53CYP3A4MAPT
SCHEMBL9116547 0.74 MEN1 (0.52) MEN1ALDH1A1TP53CYP3A4MAPT
SCHEMBL27981854 0.74 MEN1 (0.46) MEN1ALDH1A1TP53CYP3A4MAPT
SCHEMBL6151449 0.74 MEN1 (0.93) MEN1ALDH1A1TP53CYP3A4MAPT
Chlorothalonil SCHEMBL1487631 0.71 MEN1 (1.00) MEN1ALDH1A1TP53CYP3A4MAPT
Chlorothalonil SCHEMBL8200626 0.71 MEN1 (1.00) MEN1ALDH1A1TP53CYP3A4MAPT
SCHEMBL18388942 0.71 MEN1 (0.87) MEN1ALDH1A1TP53CYP3A4MAPT
Chlorothalonil SCHEMBL21254 0.71 MEN1 (1.00) MEN1ALDH1A1TP53CYP3A4MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20020048732-A1 Photothermographic material and method for forming images FUJIFILM CORPORATION (JP) 2002-04-25 US claimed
US-7229753-B2 Photothermographic material and method for forming images FUJIFILM CORPORATION (JP) 2007-06-12 US disclosed
US-7229753-B2 Photothermographic material and method for forming images FUJIFILM CORPORATION (JP) 2007-06-12 US disclosed
US-20030232295-A1 Heat developing photosensitive material FUJI PHOTO FILM CO., LTD. 2003-12-18 US disclosed
JP-2002311531-A HEAT DEVELOPABLE PHOTOSENSITIVE MATERIAL AND IMAGE FORMING METHOD USING THE SAME FUJI PHOTO FILM CO LTD 2002-10-23 JP disclosed
JP-2002278017-A HEAT DEVELOPABLE PHOTOSENSITIVE MATERIAL AND IMAGE FORMING METHOD FUJI PHOTO FILM CO LTD 2002-09-27 JP disclosed
US-20020048732-A1 Photothermographic material and method for forming images FUJIFILM CORPORATION (JP) 2002-04-25 US disclosed
US-20020048732-A1 Photothermographic material and method for forming images FUJIFILM CORPORATION (JP) 2002-04-25 US disclosed
US-5484692-A HIGH BOILING PHOSPHATE SOLVENT FUJI PHOTO FILM CO., LTD. (JP) 1996-01-16 US disclosed