Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.49 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.49 |
| ▸ | MAPT | P10636 | 1/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.47 |
| ▸ | POLB | P06746 | 3/20 | 0.47 |
| ▸ | USP2 | O75604 | 1/20 | 0.47 |
| ▸ | LMNA | P02545 | 1/20 | 0.47 |
| ▸ | PKM | P14618 | 2/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | CA1 | P00915 | 1/20 | 0.38 |
| ▸ | CA2 | P00918 | 1/20 | 0.38 |
| ▸ | CA4 | P22748 | 1/20 | 0.38 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL172075 | 0.95 | KDM4E (0.43) | KDM4EHSD17B10MAPTALDH1A1POLB | |
| SCHEMBL15083621 | 0.83 | KDM4E (0.34) | KDM4EHSD17B10MAPTALDH1A1POLB | |
| SCHEMBL22324061 | 0.82 | MAPT (0.52) | KDM4EHSD17B10MAPTALDH1A1POLB | |
| SCHEMBL6028694 | 0.82 | MAPT (0.52) | KDM4EHSD17B10MAPTALDH1A1POLB | |
| SCHEMBL22323590 | 0.82 | MAPT (0.52) | KDM4EHSD17B10MAPTALDH1A1POLB | |
| SCHEMBL15850973 | 0.81 | KDM4E (0.33) | KDM4EHSD17B10MAPTALDH1A1POLB | |
| SCHEMBL11091255 | 0.80 | KDM4E (0.52) | KDM4EHSD17B10MAPTALDH1A1POLB | |
| SCHEMBL17679424 | 0.80 | MAPT (0.44) | KDM4EHSD17B10MAPTALDH1A1POLB | |
| SCHEMBL9813351 | 0.80 | KDM4E (0.52) | KDM4EHSD17B10MAPTALDH1A1POLB | |
| SCHEMBL9813359 | 0.80 | KDM4E (0.52) | KDM4EHSD17B10MAPTALDH1A1POLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118625599-A | Photosensitive resin composition, photosensitive dry film and preparation method thereof | 杭州福斯特电子材料有限公司 | 2024-09-10 | — | — | CN | disclosed |
| US-9256127-B2 | Monomer, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-02-09 | — | — | US | disclosed |
| US-20150323865-A1 | MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-11-12 | — | — | US | disclosed |
| US-20150323865-A1 | MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-11-12 | — | — | US | disclosed |
| US-7223516-B2 | Positive type photoresist composition | FUJIFILM CORPORATION (JP) | 2007-05-29 | — | — | US | disclosed |
| US-6749983-B1 | PREFERRED POLYMERS OF THE INVENTION INCLUDE ONE OR MORE STRUCTURAL GROUPS THAT ARE CAPABLE OF REDUCING THE TEMPERATURE REQUIRED FOR EFFECTIVE DEPROTECTION OF ACID-LABILE MOIETIES OF THE POLYMER | SHIPLEY COMPANY, L.L.C. | 2004-06-15 | — | — | US | disclosed |
| US-20020006576-A1 | Positive type photoresist composition | FUJIFILM CORPORATION (JP) | 2002-01-17 | — | — | US | disclosed |
| US-6214517-B1 | PHOTORESIST HAVING AN ESTER MOIETY AND HYDROLYZABLE GROUPS TOGETHER WITH AN ACID GENERATOR; ULTRAMICRO LITHOGRAPHY, INTEGRATED CIRCUITS | FUJI PHOTO FILM CO., LTD. (JP) | 2001-04-10 | — | — | US | disclosed |
| US-6057083-A | Polymers and photoresist compositions | SHIPLEY COMPANY, L.L.C. (US) | 2000-05-02 | — | — | US | disclosed |
| EP-0915382-A2 | Novel polymers and photoresist compositions | Shipley Company LLC (US) | 1999-05-12 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20150323865-A1 | MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | H1-0, H1-3, H1-2 | KDM4E 1005/4885HSD17B10 2105/4885MAPT 4222/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.