Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.43 |
| ▸ | MAPT | P10636 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.41 |
| ▸ | POLB | P06746 | 2/20 | 0.41 |
| ▸ | USP2 | O75604 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | PKM | P14618 | 2/20 | 0.35 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.35 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | ATM | Q13315 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5489568 | 0.95 | KDM4E (0.49) | KDM4EHSD17B10MAPTALDH1A1POLB | |
| SCHEMBL17679424 | 0.85 | MAPT (0.44) | KDM4EHSD17B10MAPTALDH1A1POLB | |
| SCHEMBL17247972 | 0.83 | KDM4E (0.38) | KDM4EHSD17B10MAPTALDH1A1POLB | |
| SCHEMBL15850903 | 0.82 | ALDH1A1 (0.34) | ALDH1A1USP2LMNAKMT2AATM | |
| SCHEMBL3830715 | 0.81 | MAPT (0.47) | KDM4EHSD17B10MAPTALDH1A1POLB | |
| SCHEMBL15850922 | 0.81 | ALDH1A1 (0.33) | ALDH1A1 | |
| SCHEMBL15850963 | 0.79 | KDM4E (0.33) | KDM4EHSD17B10MAPTALDH1A1POLB | |
| SCHEMBL15083621 | 0.77 | KDM4E (0.34) | KDM4EHSD17B10MAPTALDH1A1POLB | |
| SCHEMBL1899739 | 0.76 | MAPK1 (0.41) | KDM4EHSD17B10ALDH1A1POLBSMN1; SMN2 | |
| SCHEMBL15850973 | 0.76 | KDM4E (0.33) | KDM4EHSD17B10MAPTALDH1A1POLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 200 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-121318718-A | Preparation method of methyl ester of exo-8-oxo bicyclo [3.2.1] octane-3-carboxylate | 江阴迈康升华医药科技有限公司 | 2026-01-13 | — | — | CN | disclosed |
| US-11822248-B2 | Coating compositions for use with an overcoated photoresist | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2023-11-21 | — | — | US | disclosed |
| US-11762292-B2 | Coating compositions for use with an overcoated photoresist | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2023-09-19 | — | — | US | disclosed |
| US-10042251-B2 | Zwitterionic photo-destroyable quenchers | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2018-08-07 | — | — | US | disclosed |
| US-10025181-B2 | Polymer composition and photoresist comprising same | DOW GLOBAL TECHNOLOGIES LLC (US) | 2018-07-17 | — | — | US | disclosed |
| US-10012903-B2 | Resist composition and pattern forming process | SHIN-ESTU CHEMICAL CO., LTD. (JP) | 2018-07-03 | — | — | US | disclosed |
| US-20180095367-A1 | COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2018-04-05 | — | — | US | disclosed |
| US-20180095364-A1 | ZWITTERIONIC PHOTO-DESTROYABLE QUENCHERS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2018-04-05 | — | — | US | disclosed |
| US-20180052390-A1 | ONIUM COMPOUNDS AND METHODS OF SYNTHESIS THEREOF | ROHM AND HAAS ELECTRONIC MATERIALS LLC | 2018-02-22 | — | — | US | disclosed |
| US-20180024435-A1 | RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-01-25 | — | — | US | disclosed |
| US-20120220112-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-08-30 | — | — | US | disclosed |
| US-20120202153-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-08-09 | — | — | US | disclosed |
| US-20120202153-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-08-09 | — | — | US | disclosed |
| US-20120183904-A1 | NITROGEN-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-07-19 | — | — | US | disclosed |
| US-20120183904-A1 | NITROGEN-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-07-19 | — | — | US | disclosed |
| US-20120135349-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-31 | — | — | US | disclosed |
| US-20120135349-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-31 | — | — | US | disclosed |
| US-20120108043-A1 | PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-03 | — | — | US | disclosed |
| US-20120108043-A1 | PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-03 | — | — | US | disclosed |
| EP-2426154-A1 | Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition | Fujifilm Corporation (JP) | 2012-03-07 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180095364-A1 | ZWITTERIONIC PHOTO-DESTROYABLE QUENCHERS | CRY1, CRY2, UNG | KDM4E 1388/4885HSD17B10 4407/4885MAPT 1956/4885 |
| US-10042251-B2 | Zwitterionic photo-destroyable quenchers | CRY1, CRY2, UNG | KDM4E 1388/4885HSD17B10 4407/4885MAPT 1956/4885 |
| US-20180052390-A1 | ONIUM COMPOUNDS AND METHODS OF SYNTHESIS THEREOF | NISCH, TST, SCLY | KDM4E 1890/4885HSD17B10 1794/4885MAPT 1997/4885 |
| US-20120183904-A1 | NITROGEN-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | PARG, PCNA, PAM | KDM4E 1141/4885HSD17B10 3355/4885MAPT 2949/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.