Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 5/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 5/20 | 0.41 |
| ▸ | TSHR | P16473 | 4/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.41 |
| ▸ | MEN1 | O00255 | 6/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 6/20 | 0.41 |
| ▸ | MAPT | P10636 | 5/20 | 0.41 |
| ▸ | NPC1 | O15118 | 3/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.41 |
| ▸ | CASP3 | P42574 | 2/20 | 0.39 |
| ▸ | SENP7 | Q9BQF6 | 2/20 | 0.39 |
| ▸ | SENP6 | Q9GZR1 | 2/20 | 0.39 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.39 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.39 |
| ▸ | FTO | Q9C0B1 | 1/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.38 |
| ▸ | RAB9A | P51151 | 2/20 | 0.38 |
| ▸ | ALPL | P05186 | 1/20 | 0.38 |
| ▸ | ALPI | P09923 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8858287 | 1.00 | ALDH1A1 (0.44) | ALDH1A1MAPK1TDP1TSHRHSD17B10 | |
| SCHEMBL9718487 | 0.88 | NPC1 (0.43) | ALDH1A1MAPK1TDP1TSHRHSD17B10 | |
| SCHEMBL9718484 | 0.88 | NPC1 (0.43) | ALDH1A1MAPK1TDP1TSHRHSD17B10 | |
| SCHEMBL9107947 | 0.86 | ALDH1A1 (0.41) | ALDH1A1MAPK1TDP1TSHRHSD17B10 | |
| SCHEMBL27426809 | 0.85 | TRPA1 (0.56) | ALDH1A1TDP1MEN1KMT2AMAPT | |
| SCHEMBL17506172 | 0.84 | NPC1 (0.46) | ALDH1A1MAPK1TDP1TSHRHSD17B10 | |
| SCHEMBL16694981 | 0.82 | ALDH1A1 (0.41) | ALDH1A1MAPK1TDP1TSHRHSD17B10 | |
| SCHEMBL8763712 | 0.80 | MAPT (0.48) | ALDH1A1MAPK1TDP1MEN1KMT2A | |
| SCHEMBL9874699 | 0.80 | MAPT (0.48) | ALDH1A1MAPK1TDP1MEN1KMT2A | |
| SCHEMBL16566766 | 0.80 | POLB (0.55) | ALDH1A1MAPK1TDP1TSHRMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106398783-B | A kind of No. 100 unleaded aviation gasoline and preparation method thereof | 华东理工大学 | 2018-04-20 | — | — | CN | claimed |
| US-11608455-B2 | Adhesive for semiconductor device, and high productivity method for manufacturing said device | SHOWA DENKO MATERIALS CO., LTD. (JP) | 2023-03-21 | — | — | US | disclosed |
| CN-110023413-B | Compositions and methods for labeling hydrocarbon compositions with non-mutagenic dyes | 联合色彩制造股份有限公司 | 2022-05-17 | — | — | CN | disclosed |
| CN-108352333-B | Adhesive for semiconductor, semiconductor device, and method for manufacturing semiconductor device | 昭和电工材料株式会社 | 2021-07-20 | — | — | CN | disclosed |
| US-10669454-B2 | Method for manufacturing semiconductor device including heating and pressuring a laminate having an adhesive layer | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2020-06-02 | — | — | US | disclosed |
| US-20200095481-A1 | ADHESIVE FOR SEMICONDUCTOR, SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING SAID DEVICE | RESONAC CORPORATION (JP) | 2020-03-26 | — | — | US | disclosed |
| CN-110023413-A | With the composition and method of non-mutagenic dye marker compositions of hydrocarbons | 联合色彩制造股份有限公司 | 2019-07-16 | — | — | CN | disclosed |
| US-20180312731-A1 | ADHESIVE FOR SEMICONDUCTOR, SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING SAID DEVICE | RESONAC CORPORATION (JP) | 2018-11-01 | — | — | US | disclosed |
| CN-108699460-A | Method and composition for improving aviation fuel burning | 雅富顿化学公司 | 2018-10-23 | — | — | CN | disclosed |
| EP-3363866-A1 | ALIPHATIC HYDROCARBON SOLUBLE RED DYES | United Color Manufacturing Inc. (US) | 2018-08-22 | — | — | EP | disclosed |
| US-5608112-A | Process for reducing organic pollutants | THE TRUSTEES OF PRINCETON UNIVERSITY (US) | 1997-03-04 | — | — | US | disclosed |
| WO-1997003041-A1 | PROCESS FOR REDUCING ORGANIC POLLUTANTS | THE TRUSTEES OF PRINCETON UNIVERSITY (US) | 1997-01-30 | — | — | WO | disclosed |
| US-5380622-A | Phenol-formaldehyde-naphthoquinone diazide | BASF AKTIENGESELLSCHAFT (DE) | 1995-01-10 | — | — | US | disclosed |
| US-5225312-A | Mixture of coumarin dye, quinone diazide sensitizer, and novolak resin; reflective notching reduction | MORTON INTERNATIONAL, INC. (US) | 1993-07-06 | — | — | US | disclosed |
| EP-0453950-A2 | Process for the production of negative relief images | BASF Aktiengesellschaft (DE) | 1991-10-30 | — | — | EP | disclosed |
| US-5017462-A | Process of producing negative relief copies utilizing photosensitive copying material with thermal hardening triazine compound | HOECHST AKTIENGESELLSCHAFT (DE) | 1991-05-21 | — | — | US | disclosed |
| EP-0352637-A2 | Ferroelectric liquid crystal composition, liquid crystal optical device produced by using the ferroelectric liquid crystal composition, and method of producing the liquid crystal optical device | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1990-01-31 | — | — | EP | disclosed |
| EP-0285014-A2 | Light-sensitive composition, registration material prepared therewith and process for the production of printing forms | HOECHST AKTIENGESELLSCHAFT (DE) | 1988-10-05 | — | — | EP | disclosed |
| EP-0068808-A2 | Photoresist composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1983-01-05 | — | — | EP | disclosed |
| US-4189320-A | CARRIER FO PHENOL-FORMALDEHYDE NOVOLAK REACTED WITH AN ORGANIC ISOCYANATE | AMERICAN HOECHST CORPORATION (US) | 1980-02-19 | — | — | US | disclosed |