SCHEMBL5496432

SCHEMBL5496432

CCOc1cc2cscc2cc1S(=O)(=O)O

nearest known ligand 0.40

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 1/20 0.39
TSHR P16473 3/20 0.36
MAPT P10636 3/20 0.36
TRPV4 Q9HBA0 1/20 0.36
CA12 O43570 2/20 0.36
CA1 P00915 2/20 0.36
CA2 P00918 2/20 0.36
CA9 Q16790 2/20 0.36
CTDSP1 Q9GZU7 1/20 0.36
CYP3A4 P08684 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.33
GAA P10253 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
LMNA P02545 2/20 0.33
CA14 Q9ULX7 1/20 0.33
RXFP1 Q9HBX9 1/20 0.32
SLC2A1 P11166 1/20 0.32
KDM4E B2RXH2 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5503462 0.81 ALDH1A1 (0.42) TSHRMAPTTRPV4CA12CA1
SCHEMBL10527825 0.78 TSHR (0.41) HSD17B10TSHRMAPTCYP3A4SMN1; SMN2
SCHEMBL5500535 0.76 LMNA (0.33) HSD17B10LMNA
SCHEMBL7759862 0.73 HSD17B10 (0.41) HSD17B10TSHRMAPTTRPV4CA12
SCHEMBL7759864 0.73 CTDSP1 (0.50) HSD17B10TSHRMAPTTRPV4CA12
SCHEMBL8912886 0.73 HSD17B10 (0.47) HSD17B10TSHRMAPTTRPV4CA12
SCHEMBL1642787 0.73 HSD17B10 (0.39) HSD17B10TSHRMAPTTRPV4CA12
SCHEMBL2881040 0.73 HSD17B10 (0.39) HSD17B10TSHRMAPTTRPV4CTDSP1
SCHEMBL5500268 0.72 LMNA (0.34) HSD17B10LMNA
SCHEMBL157598 0.72 HSD17B10 (0.59) HSD17B10TSHRMAPTTRPV4CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1807477-A1 ANTISTATIC TREATMENT AGENT, AND ANTISTATIC FILM, COATED ARTICLE AND PATTERN FORMING METHOD USING THE AGENT Showa Denko Kabushiki Kaisha (JP) 2007-07-18 EP disclosed
EP-1779393-A1 ANTISTATIC AGENT, ANTISTATIC FILM AND PRODUCT COATED WITH ANTISTATIC FILM SHOWA DENKO KABUSHIKI KAISHA (JP) 2007-05-02 EP disclosed
EP-1751233-A1 ELECTROCONDUCTIVE COMPOSITION AND APPLICATION THEREOF SHOWA DENKO KABUSHIKI KAISHA (JP) 2007-02-14 EP disclosed
EP-1728256-A1 CROSSLINKED SELF-DOPING TYPE ELECTRICALLY CONDUCTING POLYMER, PRODUCTION PROCESS THEREOF, PRODUCT COATED WITH THE POLYMER AND ELECTRONIC DEVICE Showa Denko K.K. (JP) 2006-12-06 EP disclosed
EP-1702372-A1 POLYMER FOR ANODE BUFFER LAYER, COATING SOLUTION FOR ANODE BUFFER LAYER, AND ORGANIC LIGHT EMITTING DEVICE Showa Denko K.K. (JP) 2006-09-20 EP disclosed
WO-2006033455-A1 ANTISTATIC TREATMENT AGENT, AND ANTISTATIC FILM, COATED ARTICLE AND PATTERN FORMING METHOD USING THE AGENT SHOWA DENKO K.K. (JP) 2006-03-30 WO disclosed
WO-2006016670-A1 ANTISTATIC AGENT, ANTISTATIC FILM AND PRODUCT COATED WITH ANTISTATIC FILM SHOWA DENKO K.K. (JP) 2006-02-16 WO disclosed
WO-2005113678-A1 ELECTROCONDUCTIVE COMPOSITION AND APPLICATION THEREOF SHOWA DENKO K.K. (JP) 2005-12-01 WO disclosed
WO-2005091309-A1 CROSSLINKED SELF-DOPING TYPE ELECTRICALLY CONDUCTING POLYMER, PRODUCTION PROCESS THEREOF, PRODUCT COATED WITH THE POLYMER AND ELECTRONIC DEVICE SHOWA DENKO K.K. (JP) 2005-09-29 WO disclosed
WO-2005057677-A1 POLYMER FOR ANODE BUFFER LAYER, COATING SOLUTION FOR ANODE BUFFER LAYER, AND ORGANIC LIGHT EMITTING DEVICE SHOWA DENKO K.K (JP) 2005-06-23 WO disclosed