Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 9/20 | 0.38 |
| ▸ | ESR2 | Q92731 | 6/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.35 |
| ▸ | CYP2C9 | P11712 | 3/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.35 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.35 |
| ▸ | AR | P10275 | 2/20 | 0.35 |
| ▸ | TP53 | P04637 | 3/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.34 |
| ▸ | HPGD | P15428 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.34 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | MIF | P14174 | 1/20 | 0.33 |
| ▸ | TYR | P14679 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29196855 | 0.88 | ESR1 (0.39) | ESR1ESR2HSD17B10CYP2C9AR | |
| SCHEMBL4580621 | 0.84 | HSPA5 (0.47) | ESR1ESR2HSD17B10CYP1A2TP53 | |
| SCHEMBL9789808 | 0.83 | ESR1 (0.38) | ESR1ESR2HSD17B10CYP2C9CYP1A2 | |
| SCHEMBL36472 | 0.78 | ESR1 (0.43) | ESR1ESR2HSD17B10CYP2C9CYP1A2 | |
| SCHEMBL29359879 | 0.78 | ESR1 (0.43) | ESR1ESR2HSD17B10CYP2C9CYP1A2 | |
| SCHEMBL551395 | 0.76 | ESR1 (0.39) | ESR1ESR2HSD17B10CYP2C9CYP1A2 | |
| SCHEMBL8890931 | 0.76 | ESR1 (0.41) | ESR1ESR2HSD17B10CYP2C9CYP1A2 | |
| SCHEMBL2051069 | 0.76 | TRPA1 (0.46) | ESR1ESR2HSD17B10CYP2C9CYP1A2 | |
| SCHEMBL1053673 | 0.76 | ESR1 (0.41) | ESR1ESR2HSD17B10CYP2C9CYP1A2 | |
| SCHEMBL30438308 | 0.76 | TRPA1 (0.46) | ESR1ESR2HSD17B10CYP2C9CYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 141 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-5239185-A | — | — | None | — | — | JP | disclosed |
| US-6384179-B1 | — | — | None | — | — | US | disclosed |
| WO-2026101220-A1 | POLYOXYMETHYLENE RESIN COMPOSITION AND MOLDED ARTICLE PREPARED THEREFROM | 코오롱이앤피 주식회사 | 2026-05-15 | — | — | WO | disclosed |
| CN-119403843-A | Polymer and method for producing same, photosensitive resin composition, cured product, and monomer compound and method for producing same | 株式会社日本触媒 | 2025-02-07 | — | — | CN | disclosed |
| WO-2023248976-A1 | POLYMER AND METHOD FOR PRODUCING SAME, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, AND MONOMER COMPOUND AND METHOD FOR PRODUCING SAME | 株式会社日本触媒 | 2023-12-28 | — | — | WO | disclosed |
| EP-4032944-B1 | METHOD FOR PRODUCING OXYMETHYLENE COPOLYMER RESIN COMPOSITION, AND OXYMETHYLENE COPOLYMER RESIN COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2023-12-13 | — | — | EP | disclosed |
| US-11820857-B2 | Method for producing oxymethylene copolymer resin composition, and oxymethylene copolymer resin composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-11-21 | — | — | US | disclosed |
| US-20230120998-A1 | ADHESIVE COMPOSITION | NIPPON SODA CO., LTD. (JP) | 2023-04-20 | — | — | US | disclosed |
| EP-3133123-B1 | SEMIAROMATIC POLYAMIDE RESIN COMPOSITION AND FORMED BODY OBTAINED BY FORMING SAME | UNITIKA LTD (JP) | 2022-12-28 | — | — | EP | disclosed |
| US-20220356290-A1 | METHOD FOR PRODUCING OXYMETHYLENE COPOLYMER RESIN COMPOSITION, AND OXYMETHYLENE COPOLYMER RESIN COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-11-10 | — | — | US | disclosed |
| US-6388049-B1 | MOLDING MATERIALS; NARROW MOLECULAR WEIGHT DISTRIBUTION | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2002-05-14 | — | — | US | disclosed |
| US-6384179-B2 | COMPRISES 30-90% BY WEIGHT OF POLYACETAL COPOLYMER HAVING A MELT INDEX OF LESS THAN 1 G/10 MIN. AS COMPONENT A AND 70-10% BY WEIGHT OF POLYACETAL COPOLYMER HAVING A MELT INDEX OF 1-100 G/10 MIN. AS COMPONENT B; TOUGHNESS, CREEP RESISTANCE | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2002-05-07 | — | — | US | disclosed |
| US-6365655-B1 | SUBJECTING AN OXYMETHYLENE COPOLYMER HAVING THERMALLY UNSTABLE TERMINAL GROUPS TO HEAT TREATMENT IN THE PRESENCE OF AT LEAST ONE QUATERNARY AMMONIUM COMPOUND FOR STABILIZATION | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 2002-04-02 | — | — | US | disclosed |
| EP-1132775-A1 | Presensitized plate useful for preparing a lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2001-09-12 | — | — | EP | disclosed |
| EP-0366377-B1 | Hydrogenated copolymer rubber, rubber composition comprising said rubber, and rubber product obtained from the rubber | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1994-12-14 | — | — | EP | disclosed |
| US-5252431-A | Light sensitive layer and silicone rubber layer; spraying pressurized liquid on the surface to remove the rubber layer | FUJI PHOTO FILM CO., LTD. (JP) | 1993-10-12 | — | — | US | disclosed |
| JP-H05239185-A | SEALING EPOXY RESIN MOLDING MATERIAL | MATSUSHITA ELECTRIC WORKS LTD | 1993-09-17 | — | — | JP | disclosed |
| US-5093426-A | Good resistance to low temperature, heat, ozone and oil | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-03-03 | — | — | US | disclosed |
| US-4522965-A | HIGH HEAT RESISTANCE AND BOND STRENGTH | BAYER AKTIENGESELLSCHAFT (DE) | 1985-06-11 | — | — | US | disclosed |
| US-4003960-A | CATALYTIC COPOLYMERIZATION OF A POLYLACTAM AND FORMALDEHYDE | SOCIETA'ITALIANA RESINE S.I.R. S.P.A. (IT) | 1977-01-18 | — | — | US | disclosed |