SCHEMBL5509448

SCHEMBL5509448

C=C(CC)C(=O)OC1CCO1

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29121629 0.91 CHRM2 (0.33) ALDH1A1
SCHEMBL3839821 0.90 MEN1 (0.35) ALDH1A1
SCHEMBL28536841 0.85
SCHEMBL28181787 0.80 SLC6A2 (0.33)
SCHEMBL27564567 0.80 ALOX15 (0.33)
SCHEMBL28927335 0.80 ALDH1A1 (0.33) ALDH1A1
SCHEMBL11667526 0.79 ALDH1A1 (0.34) ALDH1A1
SCHEMBL685088 0.79 ALDH1A1 (0.44) ALDH1A1
SCHEMBL1696785 0.76
SCHEMBL3268433 0.76 EPHX1 (0.37) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7226721-B2 Underlayer coating forming composition for lithography containing compound having protected carboxyl group NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2007-06-05 US disclosed
US-20060210915-A1 Composition for forming lower layer film for lithography comprising compound having protected carboxyl group NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2006-09-21 US disclosed
EP-1662769-A1 COMPOSITION FOR FORMING LOWER LAYER FILM FOR LITHOGRAPHY COMPRISING COMPOUND HAVING PROTECTED CARBOXYL GROUP Nissan Chemical Industries, Ltd. (JP) 2006-05-31 EP disclosed