Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.34 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1088898 | 0.83 | KDM4E (0.32) | KDM4ELMNAALDH1A1GAATDP1 | |
| SCHEMBL1615141 | 0.78 | ALDH1A1 (0.38) | KDM4ELMNAALDH1A1 | |
| SCHEMBL13806131 | 0.76 | KDM4E (0.38) | KDM4ELMNAALDH1A1TDP1EPHX2 | |
| SCHEMBL13888424 | 0.75 | — | — | |
| SCHEMBL4742224 | 0.75 | KDM4E (0.36) | KDM4EALDH1A1 | |
| SCHEMBL31695329 | 0.75 | KDM4E (0.30) | KDM4ELMNAALDH1A1 | |
| SCHEMBL11526453 | 0.74 | KDM4E (0.35) | KDM4EALDH1A1 | |
| SCHEMBL5070758 | 0.74 | — | — | |
| SCHEMBL1875963 | 0.72 | KDM4E (0.32) | KDM4ELMNA | |
| SCHEMBL32689154 | 0.72 | EPHX2 (0.40) | KDM4ELMNAALDH1A1GAATDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20130164680-A1 | PHOTORESIST COMPOSITION FOR NEGATIVE DEVELOPMENT AND PATTERN FORMING METHOD USING THEREOF | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-06-27 | — | — | US | disclosed |
| US-20130164680-A1 | PHOTORESIST COMPOSITION FOR NEGATIVE DEVELOPMENT AND PATTERN FORMING METHOD USING THEREOF | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-06-27 | — | — | US | disclosed |
| US-20120122031-A1 | PHOTORESIST COMPOSITION FOR NEGATIVE DEVELOPMENT AND PATTERN FORMING METHOD USING THEREOF | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-05-17 | — | — | US | disclosed |
| US-20120122031-A1 | PHOTORESIST COMPOSITION FOR NEGATIVE DEVELOPMENT AND PATTERN FORMING METHOD USING THEREOF | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-05-17 | — | — | US | disclosed |
| US-7714087-B2 | Polar group-containing olefin copolymer, process for preparing the same, thermoplastic resin composition containing the copolymer, and uses thereof | MITSUI CHEMICALS, INC. (JP) | 2010-05-11 | — | — | US | disclosed |
| US-7700262-B2 | Top coat material and use thereof in lithography processes | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-04-20 | — | — | US | disclosed |
| US-7700262-B2 | Top coat material and use thereof in lithography processes | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-04-20 | — | — | US | disclosed |
| US-20090137757-A1 | Polar group-containing olefin copolymer, process for preparing the same, thermoplastic resin composition containing the copolymer, and uses thereof | IMUTA JUNICHI | 2009-05-28 | — | — | US | disclosed |
| US-20080166568-A1 | TOP COAT MATERIAL AND USE THEREOF IN LITHOGRAPHY PROCESSES | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-07-10 | — | — | US | disclosed |
| US-7393907-B2 | Polar group-containing olefin copolymer, process for preparing the same, thermoplastic resin composition containing the copolymer, and uses thereof | MITSUI CHEMICALS, INC. (JP) | 2008-07-01 | — | — | US | disclosed |
| US-7335456-B2 | Top coat material and use thereof in lithography processes | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-02-26 | — | — | US | disclosed |
| US-7335456-B2 | Top coat material and use thereof in lithography processes | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-02-26 | — | — | US | disclosed |
| US-20080038676-A1 | TOP COAT MATERIAL AND USE THEREOF IN LITHOGRAPHY PROCESSES | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-02-14 | — | — | US | disclosed |