Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1058467 | 0.77 | ALDH1A1 (0.35) | ALDH1A1TSHR | |
| SCHEMBL813445 | 0.77 | ALDH1A1 (0.35) | ALDH1A1TSHR | |
| SCHEMBL8565714 | 0.77 | ALDH1A1 (0.35) | ALDH1A1TSHR | |
| Ammonia Solution, Strong SCHEMBL5178346 | 0.74 | ALDH1A1 (0.33) | ALDH1A1TSHR | |
| SCHEMBL5468780 | 0.72 | TSHR (0.38) | ALDH1A1TSHR | |
| SCHEMBL3136215 | 0.69 | — | — | |
| SCHEMBL10600317 | 0.69 | ALDH1A1 (0.33) | ALDH1A1TSHR | |
| SCHEMBL10600318 | 0.69 | ALDH1A1 (0.33) | ALDH1A1TSHR | |
| SCHEMBL4969394 | 0.69 | — | — | |
| SCHEMBL29255679 | 0.69 | RIPK1 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7238644-B2 | Laminate for printing and, printing method and printed matter using the same | KIWA CHEMICAL INDUSTRY CO., LTD. (JP) | 2007-07-03 | — | — | US | disclosed |
| US-20050148469-A1 | Laminate for printing and, printing method and printed matter using the same | KIWA CHEMICAL INDUSTRY CO., LTD. (JP) | 2005-07-07 | — | — | US | disclosed |
| US-6168897-B1 | PATTERNWISE-EXPOSING THE LAMINATED LAYER COMPRISING LIGHT SENSITIVE LAYER AND FLUORESCENT LIGHT-GENERATING LAYER TO ELECTROMAGNETIC RADIATION AND AN ELECTRON BEAM TO GENERATE A FLUORESCENT LIGHT CAUSING PHOTOCHEMICAL REACTION, DEVELOPING | KABUSHIKI KAISHA TOSHIBA (JP) | 2001-01-02 | — | — | US | disclosed |
| US-5928841-A | Method of photoetching at 180 to 220 | KABUSHIKI KAISHA TOSHIBA (JP) | 1999-07-27 | — | — | US | disclosed |
| EP-0277555-A2 | Copolymers with 0-nitrocarbinol ester groups, and process for preparing two-layer resists and semiconductor devices | BASF Aktiengesellschaft (DE) | 1988-08-10 | — | — | EP | disclosed |