SCHEMBL5518304

SCHEMBL5518304

[O]CC(=O)OC1CCCO1

nearest known ligand 0.40

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.40
POLB P06746 1/20 0.40
ALDH1A1 P00352 1/20 0.38
KMT2A Q03164 3/20 0.33
MEN1 O00255 2/20 0.33
USP2 O75604 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
HPGD P15428 3/20 0.32
TP53 P04637 1/20 0.32
ALOX12 P18054 1/20 0.32
HTT P42858 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5521474 0.94 MEN1 (0.38) LMNAPOLBALDH1A1KMT2AMEN1
SCHEMBL10440880 0.86 LMNA (0.39) LMNAPOLBALDH1A1KMT2AMEN1
SCHEMBL26645777 0.86 ALDH1A1 (0.46) LMNAPOLBALDH1A1KMT2AMEN1
SCHEMBL26645786 0.86 POLB (0.41) LMNAPOLBALDH1A1KMT2AMEN1
SCHEMBL5674908 0.82 LMNA (0.42) LMNAPOLBALDH1A1KMT2AMEN1
SCHEMBL5675059 0.82 LMNA (0.39) LMNAPOLBALDH1A1KMT2AMEN1
SCHEMBL10548119 0.82 LMNA (0.54) LMNAPOLBALDH1A1KMT2AMEN1
SCHEMBL29271879 0.82 LMNA (0.39) LMNAPOLBALDH1A1KMT2AMEN1
SCHEMBL2125922 0.82 CHRM2 (0.42) LMNAPOLBALDH1A1KMT2AMEN1
SCHEMBL8199690 0.82 LMNA (0.39) LMNAPOLBALDH1A1KMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070148585-A1 Hyperbranched polymer, production method therefor and resist composition containing hyperbranched polymer LION CORPORATION. 2007-06-28 US disclosed
EP-1698645-A1 HYPERBRANCHED POLYMER, PROCESS FOR PRODUCING THE SAME AND RESIST COMPOSITION CONTAINING THE HYPERBRANCHED POLYMER Lion Corporation (JP) 2006-09-06 EP disclosed
US-20060073411-A1 Chemically amplified resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2006-04-06 US disclosed
US-20040191674-A1 Chemical amplification resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-09-30 US disclosed
US-6656660-B1 Resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-12-02 US disclosed
EP-1024406-A1 Resist composition WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 2000-08-02 EP disclosed