Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 5/20 | 0.61 |
| ▸ | ESR2 | Q92731 | 3/20 | 0.61 |
| ▸ | SHBG | P04278 | 1/20 | 0.53 |
| ▸ | PTGS1 | P23219 | 3/20 | 0.50 |
| ▸ | PTGS2 | P35354 | 3/20 | 0.50 |
| ▸ | HMGB1 | P09429 | 1/20 | 0.50 |
| ▸ | CXCL12 | P48061 | 1/20 | 0.50 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.43 |
| ▸ | THRA | P10827 | 1/20 | 0.42 |
| ▸ | THRB | P10828 | 1/20 | 0.42 |
| ▸ | CA1 | P00915 | 1/20 | 0.42 |
| ▸ | CA2 | P00918 | 1/20 | 0.42 |
| ▸ | IDH1 | O75874 | 1/20 | 0.42 |
| ▸ | TMEM97 | Q5BJF2 | 1/20 | 0.42 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.42 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1176784 | 0.93 | ESR1 (0.60) | ESR1ESR2SHBGPTGS1PTGS2 | |
| SCHEMBL27625130 | 0.90 | PTGS1 (0.65) | ESR1ESR2SHBGPTGS1PTGS2 | |
| SCHEMBL3710965 | 0.88 | SHBG (0.61) | ESR1ESR2SHBGPTGS1PTGS2 | |
| SCHEMBL13609029 | 0.88 | SHBG (0.61) | ESR1ESR2SHBGPTGS1PTGS2 | |
| SCHEMBL4063026 | 0.88 | SHBG (0.61) | ESR1ESR2SHBGPTGS1PTGS2 | |
| SCHEMBL30375336 | 0.88 | SHBG (0.61) | ESR1ESR2SHBGPTGS1PTGS2 | |
| SCHEMBL10717284 | 0.88 | ESR1 (0.46) | ESR1ESR2SHBGPTGS1PTGS2 | |
| SCHEMBL14552362 | 0.87 | ESR1 (0.54) | ESR1ESR2SHBGPTGS1PTGS2 | |
| Bisphenol A SCHEMBL9861262 | 0.86 | ESR1 (0.52) | ESR1ESR2SHBGPTGS1PTGS2 | |
| SCHEMBL8680249 | 0.86 | ESR1 (0.55) | ESR1ESR2SHBGPTGS1PTGS2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5238775-A | Alkali-soluble resin and photoinitiator comprising a 1,2-quinone diazide sulfonate derivative of 1,1-bis (hydroxyphenyl)-1-(4-(4-hydroxybenzyl)ethanes; positive photoresists; heat resistance; inhibits scum | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1993-08-24 | — | — | US | claimed |
| CN-113646052-B | Reversible thermochromic composition, reversible thermochromic microcapsule pigment, and writing instrument | 百乐墨水株式会社 | 2024-05-17 | — | — | CN | disclosed |
| CN-113646052-A | Reversible thermal discoloration composition, reversible thermal discoloration microcapsule pigment encapsulating the reversible thermal discoloration composition, and writing instrument using the reversible thermal discoloration microcapsule pigment | 百乐墨水株式会社 | 2021-11-12 | — | — | CN | disclosed |
| WO-2020209118-A1 | REVERSIBLY THERMOCHROMIC AQUEOUS INK COMPOSITION FOR WRITING UTENSILS, AND REFILL AND WATER-BASED BALLPOINT PEN EACH INTERNALLY CONTAINING SAME | 株式会社パイロットコーポレーション | 2020-10-15 | — | — | WO | disclosed |
| WO-2020203603-A1 | REVERSIBLE THERMOCHROMIC COMPOSITION, REVERSIBLE THERMOCHROMIC MICROCAPSULE PIGMENT COMPRISING SAME, AND WRITING INSTRUMENT USING SAME | パイロットインキ株式会社 | 2020-10-08 | — | — | WO | disclosed |
| US-10544254-B2 | Preparation and application of dicyclopentadiene-phenol and 2,6-dimethyl phenol copolymer epoxy resin | NAN YA PLASTICS CORPORATION (TW) | 2020-01-28 | — | — | US | disclosed |
| US-20180208710-A1 | Preparation and application of dicyclopentadiene-phenol and 2,6-dimethyl phenol copolymer epoxy resin | NAN YA PLASTICS CORPORATION (TW) | 2018-07-26 | — | — | US | disclosed |
| US-20180208710-A1 | Preparation and application of dicyclopentadiene-phenol and 2,6-dimethyl phenol copolymer epoxy resin | NAN YA PLASTICS CORPORATION (TW) | 2018-07-26 | — | — | US | disclosed |
| US-8173349-B2 | Photosensitive resin composition, polymer compound, method of forming a pattern, and electronic device | FUJIFILM CORPORATION (JP) | 2012-05-08 | — | — | US | disclosed |
| US-8173349-B2 | Photosensitive resin composition, polymer compound, method of forming a pattern, and electronic device | FUJIFILM CORPORATION (JP) | 2012-05-08 | — | — | US | disclosed |
| CN-1507582-A | Resist remover composition | ����ɪ��٩��ʽ���� | 2004-06-23 | — | — | CN | disclosed |
| CN-1118003-C | Photoresist scavenger composition | TONGJIN CHEMICALS INDUSTRY CO (KR) | 2003-08-13 | — | — | CN | disclosed |
| WO-2002095500-A1 | RESIST REMOVER COMPOSITION | DONGJIN SEMICHEM CO., LTD. (KR) | 2002-11-28 | — | — | WO | disclosed |
| US-6140027-A | WATER SOLUBLE AMINE, POLAR ORGANIC SOLVENT, TRIAZOLE COMPOUND AND SILICONE SURFACTANT | DONGJIN SEMICHEM CO., LTD. (KR) | 2000-10-31 | — | — | US | disclosed |
| CN-1258730-A | Photoresist scavenger composition | TONGJIN CHEMICALS INDUSTRY CO (KR) | 2000-07-05 | — | — | CN | disclosed |
| US-6013407-A | PHOTORESISTS WITH PHENOLIC RESINS, QUINONEDIAZIDE SULFONATES, PHOTOSENSITIVE AGENTS AND PHENOLIC COMPOUNDS | NIPPON ZEON CO., LTD. (JP) | 2000-01-11 | — | — | US | disclosed |
| EP-0831370-A1 | POSITIVE RESIST COMPOSITION | NIPPON ZEON CO., LTD. (JP) | 1998-03-25 | — | — | EP | disclosed |
| US-5238775-A | Alkali-soluble resin and photoinitiator comprising a 1,2-quinone diazide sulfonate derivative of 1,1-bis (hydroxyphenyl)-1-(4-(4-hydroxybenzyl)ethanes; positive photoresists; heat resistance; inhibits scum | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1993-08-24 | — | — | US | disclosed |
| US-4608430-A | ENGINEERING THERMOPLASTICS | GENERAL ELECTRIC COMPANY (US) | 1986-08-26 | — | — | US | disclosed |
| EP-0048878-A1 | Phosphorous-acid esters containing hydroxyphenyl groups, process for their preparation and their use as stabilisers for thermoplastic polyesters | BAYER AG (DE) | 1982-04-07 | — | — | EP | disclosed |