SCHEMBL5527366

SCHEMBL5527366

CCC(C)c1cc(C(C)(C)c2ccc(O)cc2)ccc1O

nearest known ligand 0.87

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RORC P51449 1/20 0.87
ESR1 P03372 9/20 0.52
ESR2 Q92731 6/20 0.52
CYP3A4 P08684 2/20 0.52
TSHR P16473 2/20 0.52
HPGD P15428 2/20 0.52
HSD17B10 Q99714 2/20 0.52
AR P10275 1/20 0.52
SLC6A2 P23975 1/20 0.52
SLC6A4 P31645 1/20 0.52
HTR6 P50406 1/20 0.52
ESRRG P62508 1/20 0.52
SLC6A3 Q01959 1/20 0.52
ALDH1A1 P00352 2/20 0.46
KLF10 Q13118 1/20 0.45
ALOX15 P16050 2/20 0.39
USP2 O75604 1/20 0.39
GAA P10253 1/20 0.39
PKM P14618 1/20 0.39
ALOX12 P18054 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15625207 0.95 RORC (0.96) RORCESR1ESR2CYP3A4TSHR
SCHEMBL29393026 0.93 RORC (1.00) RORCESR1ESR2CYP3A4TSHR
SCHEMBL125246 0.93 RORC (1.00) RORCESR1ESR2CYP3A4TSHR
SCHEMBL29492951 0.93 RORC (1.00) RORCESR1ESR2CYP3A4TSHR
SCHEMBL278569 0.86 RORC (0.74) RORCESR1ESR2CYP3A4TSHR
SCHEMBL16609113 0.86 RORC (0.84) RORCESR1ESR2TSHRHPGD
SCHEMBL5520749 0.85 RORC (0.72) RORCESR1ESR2CYP3A4TSHR
SCHEMBL8672991 0.85 RORC (0.62) RORCESR1ESR2CYP3A4TSHR
SCHEMBL2034981 0.83 RORC (0.80) RORCESR1ESR2CYP3A4TSHR
SCHEMBL31143653 0.81 ESR1 (0.57) RORCESR1ESR2CYP3A4TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8173349-B2 Photosensitive resin composition, polymer compound, method of forming a pattern, and electronic device FUJIFILM CORPORATION (JP) 2012-05-08 US disclosed
US-8173349-B2 Photosensitive resin composition, polymer compound, method of forming a pattern, and electronic device FUJIFILM CORPORATION (JP) 2012-05-08 US disclosed
US-20100080963-A1 PHOTOSENSITIVE RESIN COMPOSITION, POLYMER COMPOUND, METHOD OF FORMING A PATTERN, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2010-04-01 US disclosed
US-20100080963-A1 PHOTOSENSITIVE RESIN COMPOSITION, POLYMER COMPOUND, METHOD OF FORMING A PATTERN, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2010-04-01 US disclosed