SCHEMBL5520749

SCHEMBL5520749

CCC(C)c1cc(C(C)(C)c2ccc(O)cc2O)ccc1O

nearest known ligand 0.72

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RORC P51449 1/20 0.72
TSHR P16473 3/20 0.40
ESR1 P03372 6/20 0.38
HSD17B10 Q99714 3/20 0.38
ALOX15 P16050 3/20 0.38
TYR P14679 3/20 0.38
ALDH1A1 P00352 2/20 0.38
CYP2C9 P11712 2/20 0.38
NR1I2 O75469 1/20 0.38
LMNA P02545 1/20 0.38
MIF P14174 1/20 0.38
HTT P42858 1/20 0.38
NFE2L2 Q16236 1/20 0.38
KLF10 Q13118 1/20 0.37
ESR2 Q92731 3/20 0.36
HPGD P15428 2/20 0.36
USP2 O75604 1/20 0.36
GAA P10253 1/20 0.36
PKM P14618 1/20 0.36
CYP3A4 P08684 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL278569 0.93 RORC (0.74) RORCTSHRESR1HSD17B10ALOX15
SCHEMBL5527366 0.85 RORC (0.87) RORCTSHRESR1HSD17B10ALOX15
SCHEMBL29492951 0.85 RORC (1.00) RORCTSHRESR1HSD17B10ALOX15
SCHEMBL29393026 0.85 RORC (1.00) RORCTSHRESR1HSD17B10ALOX15
SCHEMBL125246 0.85 RORC (1.00) RORCTSHRESR1HSD17B10ALOX15
SCHEMBL5524291 0.84 RORC (0.62) RORCTSHRESR1HSD17B10ALOX15
SCHEMBL15625207 0.83 RORC (0.96) RORCTSHRESR1HSD17B10ALOX15
SCHEMBL13126742 0.82 RORC (0.57) RORCTSHRESR1HSD17B10ALOX15
SCHEMBL122882 0.81 RORC (0.61) RORCTSHRESR1HSD17B10ALOX15
SCHEMBL28343867 0.79 RORC (0.59) RORCTSHRESR1HSD17B10ALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8173349-B2 Photosensitive resin composition, polymer compound, method of forming a pattern, and electronic device FUJIFILM CORPORATION (JP) 2012-05-08 US disclosed
US-8173349-B2 Photosensitive resin composition, polymer compound, method of forming a pattern, and electronic device FUJIFILM CORPORATION (JP) 2012-05-08 US disclosed
US-20100080963-A1 PHOTOSENSITIVE RESIN COMPOSITION, POLYMER COMPOUND, METHOD OF FORMING A PATTERN, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2010-04-01 US disclosed
US-20100080963-A1 PHOTOSENSITIVE RESIN COMPOSITION, POLYMER COMPOUND, METHOD OF FORMING A PATTERN, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2010-04-01 US disclosed
JP-2000239206-A ASYMMETRIC ALKYLIDENE POLYHYDRIC PHENOLS AND PRODUCTION THEREOF HONSHU CHEM IND CO LTD 2000-09-05 JP disclosed