Imidazole

Imidazole

SCHEMBL553108

[SrH2].c1c[nH]cn1

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Imidazole SCHEMBL897 0.96 — —
Imidazole SCHEMBL19028065 0.96 ALDH1A1 (1.00) —
Imidazole SCHEMBL2635292 0.96 — —
Imidazole SCHEMBL1331920 0.96 — —
Imidazole SCHEMBL1331382 0.96 — —
Imidazole SCHEMBL28744226 0.96 ALDH1A1 (1.00) —
Imidazole SCHEMBL30382963 0.96 — —
Imidazole SCHEMBL2684565 0.96 ALDH1A1 (1.00) —
Imidazole SCHEMBL3240045 0.93 — —
Imidazole SCHEMBL5798062 0.93 ALDH1A1 (0.93) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119896065-A Integrated dipole region of transistor 应用材料公司 2025-04-25 — — CN claimed
WO-2024039647-A1 INTEGRATED DIPOLE REGION FOR TRANSISTOR APPLIED MATERIALS, INC. (US) 2024-02-22 — — WO claimed
US-20240063064-A1 INTEGRATED DIPOLE REGION FOR TRANSISTOR APPLIED MATERIALS, INC. (US) 2024-02-22 — — US claimed
CN-102344413-B Volatile imidazoles and group 2 imidazole based metal precursors AIR PROD & CHEM 2015-07-22 — — CN claimed
CN-102344413-A Volatile imidazoles and group 2 imidazole based metal precursors AIR PROD & CHEM 2012-02-08 — — CN claimed
CN-119896065-A Integrated dipole region of transistor 应用材料公司 2025-04-25 — — CN disclosed
WO-2024039647-A1 INTEGRATED DIPOLE REGION FOR TRANSISTOR APPLIED MATERIALS, INC. (US) 2024-02-22 — — WO disclosed
US-20240063064-A1 INTEGRATED DIPOLE REGION FOR TRANSISTOR APPLIED MATERIALS, INC. (US) 2024-02-22 — — US disclosed
CN-113387889-B Preparation method of porous imidazole metal compound nano-powder 湖南文理学院 2023-05-09 — — CN disclosed
CN-113387889-A Novel porous imidazole metal compound nano powder and preparation method thereof 湖南文理学院 2021-09-14 — — CN disclosed
CN-102344413-B Volatile imidazoles and group 2 imidazole based metal precursors AIR PROD & CHEM 2015-07-22 — — CN disclosed
EP-2644284-B1 Group 2 imidazolate formulations for direct liquid injection AIR PROD & CHEM (US) 2015-06-03 — — EP disclosed
US-8703103-B2 Volatile imidazoles and group 2 imidazole based metal precursors AIR PRODUCTS AND CHEMICALS, INC. (US) 2014-04-22 — — US disclosed
CN-103361630-A Group 2 imidazolate formulations for direct liquid injection AIR PROD & CHEM 2013-10-23 — — CN disclosed
US-20130260025-A1 Group 2 Imidazolate Formulations for Direct Liquid Injection VERSUM MATERIALS US, LLC 2013-10-03 — — US disclosed
EP-2644284-A1 Group 2 Imidazolate Formulations for Direct Liquid Injection Air Products and Chemicals, Inc. (US) 2013-10-02 — — EP disclosed
CN-101248034-B Method for producing organometallic framework materials containing main group metal ions BASF SE 2012-07-04 — — CN disclosed
US-20120035351-A1 Volatile Imidazoles and Group 2 Imidazole Based Metal Precursors AIR PRODUCTS AND CHEMICALS, INC. (US) 2012-02-09 — — US disclosed
CN-102344413-A Volatile imidazoles and group 2 imidazole based metal precursors AIR PROD & CHEM 2012-02-08 — — CN disclosed
EP-2371821-A1 Volatile imidazoles and group 2 imidazole based metal precursors Air Products and Chemicals, Inc. (US) 2011-10-05 — — EP disclosed
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