SCHEMBL5536655

SCHEMBL5536655

C=[C]Nc1ccccc1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7698024 0.75 ALDH1A1 (0.50)
SCHEMBL1922270 0.75 ALDH1A1 (0.50)
SCHEMBL5547420 0.72 LMNA (0.42)
SCHEMBL5539158 0.71 MAPT (0.52)
SCHEMBL2462 0.71
Water SCHEMBL11606806 0.71 ALDH1A1 (0.45)
Benzene SCHEMBL28686547 0.71 ALDH1A1 (0.45)
SCHEMBL57468 0.71
SCHEMBL1259441 0.71
Water SCHEMBL11606809 0.71 ALDH1A1 (0.45)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5399459-A High speed writing EASTMAN KODAK COMPANY (US) 1995-03-21 US claimed
EP-0050558-B1 PHOTOGRAPHIC EMULSIONS AND ELEMENTS CAPABLE OF FORMING DIRECT-POSITIVE IMAGES EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1985-07-17 EP claimed
US-4075017-A Photothermographic material containing a combination of energy-sensitive organic dyes and process of forming a positive or negative image with the material EASTMAN KODAK COMPANY (US) 1978-02-21 US claimed
US-RE29168-E HEAT SENSITIVE, ANTIHALATION LAYER EASTMAN KODAK COMPANY (US) 1977-04-05 US claimed
EP-2570418-A2 2,3-dihydro-6-nitroimidazo[2,1-b]oxazoles compound OTSUKA PHARMACEUTICAL CO., LTD. (JP) 2013-03-20 EP disclosed
EP-1555267-B1 2,3-DIHYDRO-6-NITROIMIDAZO[2,1-b]OXAZOLES OTSUKA PHARMA CO LTD (JP) 2013-01-16 EP disclosed
US-7262212-B2 2,3-dihydro-6-nitroimidazo[2,1-b]oxazoles OTSUKA PHARMACEUTICAL CO., LTD. (JP) 2007-08-28 US disclosed
US-20060094767-A1 2,3-Dihydro-6-nitroimidazo[2,1-b]oxazoles OTSUKA PHARMACEUTICAL CO., LTD. (JP) 2006-05-04 US disclosed
EP-1555267-A1 2,3-DIHYDRO-6-NITROIMIDAZO 2,1-b OXAZOLES OTSUKA PHARMACEUTICAL CO., LTD. (JP) 2005-07-20 EP disclosed
US-6656665-B1 Photosensitive resin and mineral particle composition SAINT-GOBAIN VITRAGE (FR) 2003-12-02 US disclosed
EP-0795790-B1 Peel-developable lithographic printing plate KODAK POLYCHROME GRAPHICS LLC (US) 2002-09-25 EP disclosed
EP-0730201-B1 Sensitized photopolymerizable compositions and use thereof in lithographic printing plates KODAK POLYCHROME GRAPHICS LLC (US) 2001-05-09 EP disclosed
EP-0576622-A1 LITHOGRAPHIC PRINTING PLATES EASTMAN KODAK COMPANY (US) 1994-01-05 EP disclosed
WO-1992017821-A1 LITHOGRAPHIC PRINTING PLATES EASTMAN KODAK COMPANY (US) 1992-10-15 WO disclosed
US-5141839-A LITHOGRAPHIC PRINTING PLATES HAVING A RADIATION-SENSITIVE LAYER COMPRISING A PHOTOCROSSLINKABLE POLYMER, A LEUCO DYE, A PHOTOOXIDANT AND A HETEROAROMATIC AMINE N-OXIDE EASTMAN KODAK COMPANY (US) 1992-08-25 US disclosed
US-5141842-A Negative working lithography printing plates EASTMAN KODAK COMPANY (US) 1992-08-25 US disclosed
US-4197080-A Radiation-cleavable nondiffusible compounds and photographic elements and processes employing them EASTMAN KODAK COMPANY (US) 1980-04-08 US disclosed
US-4075017-A Photothermographic material containing a combination of energy-sensitive organic dyes and process of forming a positive or negative image with the material EASTMAN KODAK COMPANY (US) 1978-02-21 US disclosed
US-RE29168-E HEAT SENSITIVE, ANTIHALATION LAYER EASTMAN KODAK COMPANY (US) 1977-04-05 US disclosed
US-4000130-A INDOLE DYES, POLYACRYLONITRILE BAYER AKTIENGESELLSCHAFT (DT) 1976-12-28 US disclosed