Known targets — ChEMBL curated mechanism
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
The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | CA12 | O43570 | 1/20 | 0.31 |
| ▸ | CA1 | P00915 | 1/20 | 0.31 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
| ▸ | CA9 | Q16790 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2300632 | 0.87 | — | — | |
| Formaldehyde SCHEMBL1078250 | 0.85 | — | — | |
| Hydrochloric Acid SCHEMBL15010572 | 0.85 | — | — | |
| Sulfuric Acid SCHEMBL27789111 | 0.74 | TSHR (0.37) | TSHRSMN1; SMN2MAPTCA12CA1 | |
| Sulfuric Acid SCHEMBL965239 | 0.74 | TSHR (0.37) | TSHRSMN1; SMN2MAPTCA12CA1 | |
| Sulfuric Acid SCHEMBL1415592 | 0.72 | TSHR (0.36) | TSHRSMN1; SMN2MAPTCA12CA1 | |
| Sulfuric Acid SCHEMBL11387198 | 0.72 | TSHR (0.36) | TSHRSMN1; SMN2MAPTCA12CA1 | |
| Sulfuric Acid SCHEMBL1100829 | 0.70 | NPSR1 (0.35) | TSHRSMN1; SMN2MAPTCA12CA1 | |
| Sulfuric Acid SCHEMBL1100828 | 0.70 | NPSR1 (0.35) | TSHRSMN1; SMN2MAPTCA12CA1 | |
| Sulfuric Acid SCHEMBL8664215 | 0.70 | ALDH1A1 (0.37) | TSHRSMN1; SMN2MAPTCA12CA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 315 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9165777-B2 | Polishing agent and method for polishing substrate using the polishing agent | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2015-10-20 | — | — | US | claimed |
| US-9129900-B2 | — | — | 2015-09-08 | — | — | US | claimed |
| US-8617275-B2 | Polishing agent and method for polishing substrate using the polishing agent | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2013-12-31 | — | — | US | claimed |
| US-8597550-B2 | Method for producing water-resistant polarizing film | NITTO DENKO CORPORATION (JP) | 2013-12-03 | — | — | US | claimed |
| US-20110097483-A1 | METHOD FOR PRODUCING WATER-RESISTANT POLARIZING FILM | NITTO DENKO CORPORATION (JP) | 2011-04-28 | — | — | US | claimed |
| US-12029800-B2 | Composite particles including anionic polymer and cationic polymer or peptide, and method for producing composite particles | POLA CHEMICAL INDUSTRIES, INC. (JP) | 2024-07-09 | — | — | US | disclosed |
| CN-118076892-A | Blood cell separating agent for analysis and blood cell separating method | 日东纺绩株式会社 | 2024-05-24 | — | — | CN | disclosed |
| US-20240150605-A1 | PRETREATMENT LIQUID FOR INKJET TEXTILE PRINTING, INK SET, AND TEXTILE PRINTING METHOD | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2024-05-09 | — | — | US | disclosed |
| US-20240150604-A1 | PRETREATMENT COMPOSITION, PRINT SET, AND TEXTILE PRINTING METHOD | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2024-05-09 | — | — | US | disclosed |
| CN-115538197-B | Method for producing printed matter | 理想科学工业株式会社 | 2024-04-05 | — | — | CN | disclosed |
| EP-3757179-B1 | INK COMPOSITION FOR INK JET PRINTING, IMAGE FORMING METHOD, AND RECORDED MATERIAL | FUJIFILM CORP (JP) | 2024-03-13 | — | — | EP | disclosed |
| CN-115192468-B | Composite particles comprising anionic polymer and cationic polymer or peptide, and method for producing same | 宝丽化学工业有限公司 | 2024-02-13 | — | — | CN | disclosed |
| US-20100255365-A1 | PACKING MATERIAL FOR LITHIUM CELL AND PRODUCTION METHOD THEREOF | TOPPAN PRINTING CO., LTD. (JP) | 2010-10-07 | — | — | US | disclosed |
| EP-2202823-A1 | PACKING MATERIAL FOR LITHIUM BATTERY AND METHOD FOR MANUFACTURING THE SAME | Toppan Printing Co., Ltd. (JP) | 2010-06-30 | — | — | EP | disclosed |
| US-20100068248-A1 | Patch and patch preparation | NITTO DENKO CORPORATION | 2010-03-18 | — | — | US | disclosed |
| EP-2163267-A2 | Patch and patch preparation | Nitto Denko Corporation (JP) | 2010-03-17 | — | — | EP | disclosed |
| US-20100015451-A1 | PACKING MATERIAL FOR LITHIUM CELL AND PRODUCTION METHOD THEREOF | TOPPAN PRINTING CO., LTD. (JP) | 2010-01-21 | — | — | US | disclosed |
| EP-2112703-A1 | PACKAGING MATERIAL FOR LITHIUM BATTERY AND METHOD FOR PRODUCING THE SAME | Toppan Printing Co., Ltd. (JP) | 2009-10-28 | — | — | EP | disclosed |
| US-20090258203-A1 | Inkjet recording method and recording product | SEIKO EPSON CORPORATION (JP) | 2009-10-15 | — | — | US | disclosed |
| US-20090095637-A1 | Electrochemical polishing method and polishing method | EBARA CORPORATION (JP) | 2009-04-16 | — | — | US | disclosed |