Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.54 |
| ▸ | POLB | P06746 | 1/20 | 0.43 |
| ▸ | APEX1 | P27695 | 1/20 | 0.43 |
| ▸ | HTT | P42858 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.43 |
| ▸ | THRB | P10828 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13160588 | 1.00 | TSHR (0.54) | TSHRPOLBAPEX1HTTTDP1 | |
| SCHEMBL11964329 | 0.98 | TSHR (0.51) | TSHRPOLBAPEX1HTTTDP1 | |
| SCHEMBL17439214 | 0.95 | TSHR (0.47) | TSHRPOLBAPEX1HTTTDP1 | |
| SCHEMBL2742236 | 0.92 | THRB (0.47) | TSHRPOLBAPEX1HTTTDP1 | |
| SCHEMBL16018731 | 0.90 | TSHR (0.44) | TSHRPOLBAPEX1HTTTDP1 | |
| SCHEMBL16020887 | 0.85 | THRB (0.41) | TSHRPOLBAPEX1HTTTDP1 | |
| SCHEMBL2883301 | 0.83 | TSHR (0.38) | TSHRTHRBALDH1A1L3MBTL1 | |
| SCHEMBL16018732 | 0.82 | THRB (0.38) | TSHRPOLBAPEX1HTTTDP1 | |
| SCHEMBL17779905 | 0.81 | TSHR (0.40) | TSHRPOLBAPEX1HTTTDP1 | |
| SCHEMBL11964338 | 0.81 | TSHR (0.34) | TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9017924-B2 | Resist composition, method of forming resist pattern, polymeric compound and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-04-28 | — | — | US | disclosed |
| US-20140255853-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-09-11 | — | — | US | disclosed |
| US-8378016-B2 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-02-19 | — | — | US | disclosed |
| US-20070149702-A1 | Resin suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED | 2007-06-28 | — | — | US | disclosed |