SCHEMBL5544540

SCHEMBL5544540

C=C(CCC(Cl)Cl)C(=O)O

nearest known ligand 0.40

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
TET2 Q6N021 5/20 0.39
TET3 O43151 1/20 0.39
TET1 Q8NFU7 1/20 0.39
GRIK1 P39086 1/20 0.38
GRIK2 Q13002 1/20 0.38
GRM1 Q13255 1/20 0.38
GRM2 Q14416 1/20 0.38
ALOX15 P16050 1/20 0.33
HSD17B10 Q99714 1/20 0.33
FOLH1 Q04609 1/20 0.31
LMNA P02545 1/20 0.30
TBXAS1 P24557 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5426723 0.83 TET2 (0.43) TET2TET3TET1GRIK1GRIK2
SCHEMBL8366245 0.82 TBXAS1 (0.40) TET2TET3TET1GRIK1GRIK2
SCHEMBL4939024 0.81 TET2 (0.37) TET2TET3TET1GRIK1GRIK2
SCHEMBL4938556 0.79 TET2 (0.35) TET2TET3TET1GRIK1GRIK2
SCHEMBL9336384 0.79 TET2 (0.35) TET2TET3TET1GRIK1GRIK2
SCHEMBL1074950 0.77 TET2 (0.46) TET2TET3TET1GRIK1GRIK2
SCHEMBL1879470 0.76 TET2 (0.41) TET2TET3TET1GRIK1GRIK2
SCHEMBL14533245 0.76 FOLH1 (0.60) TET2TET3TET1GRIK1GRIK2
SCHEMBL23251 0.75 CA1 (0.48) TET2TET3TET1GRIK1GRIK2
SCHEMBL5201802 0.75 GRIK1 (0.48) TET2TET3TET1GRIK1GRIK2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070251638-A1 Method and composition for the adhesion of materials QUANTUM RESEARCH OF AMERICA INC. (US) 2007-11-01 US claimed
EP-0015459-A1 Article comprising a negative X-ray resist containing poly(2,3-dichloro-1-propyl acrylate) and poly(glycidyl methacrylate-co-ethyl acrylate) and method using this resist Western Electric Company, Incorporated (US) 1980-09-17 EP claimed
WO-1980001847-A1 NEGATIVE X-RAY RESIST CONTAINING POLY(2,3-DICHLORO-1-PROPYL ACRYLATE)AND POLY(GLYCIDYL METHACRYLATE-CO-ETHYL ACRYLATE) WESTERN ELECTRIC CO (US) 1980-09-04 WO claimed
US-20070251638-A1 Method and composition for the adhesion of materials QUANTUM RESEARCH OF AMERICA INC. (US) 2007-11-01 US disclosed
US-4784719-A Dry etching procedure AMERICAN TELEPHONE AND TELEGRAPH COMPANY, AT&T BELL LABORATORIES (US) 1988-11-15 US disclosed
EP-0140240-B1 PROCESS FOR FORMING AN ORGANIC THIN FILM HITACHI, LTD. (JP) 1988-07-06 EP disclosed
EP-0229104-A1 PROCEDURE FOR FABRICATING DEVICES INVOLVING DRY ETCHING AT&T Corp. (US) 1987-07-22 EP disclosed
WO-1987000345-A1 PROCEDURE FOR FABRICATING DEVICES INVOLVING DRY ETCHING AMERICAN TELEPHONE & TELEGRAPH COMPANY (US) 1987-01-15 WO disclosed
US-4604294-A VACUUM VAPOR DEPOSITION HITACHI, LTD. (JP) 1986-08-05 US disclosed