SCHEMBL5550758

SCHEMBL5550758

OC(O)CCN1CCCC1

nearest known ligand 0.46

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.46
KMT2A Q03164 1/20 0.46
HRH3 Q9Y5N1 1/20 0.43
MAPT P10636 4/20 0.42
ATM Q13315 1/20 0.42
ALDH1A1 P00352 2/20 0.41
POLB P06746 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.39
CARM1 Q86X55 1/20 0.39
PRMT6 Q96LA8 1/20 0.39
PRMT8 Q9NR22 1/20 0.39
LMNA P02545 1/20 0.38
CYP1A2 P05177 1/20 0.38
MAPK1 P28482 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
TSHR P16473 1/20 0.35
HSD17B10 Q99714 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18668199 0.97 MEN1 (0.50) MEN1KMT2AHRH3MAPTATM
SCHEMBL21990873 0.97 MEN1 (0.50) MEN1KMT2AHRH3MAPTATM
SCHEMBL11250542 0.88 ALOX15 (0.38) KMT2AALDH1A1LMNA
SCHEMBL7769335 0.84 HRH3 (0.52) MEN1KMT2AHRH3MAPTATM
SCHEMBL3271095 0.81 HRH3 (0.46) MEN1KMT2AHRH3MAPTATM
SCHEMBL1455583 0.79 HRH3 (0.49) MEN1KMT2AHRH3MAPTATM
SCHEMBL10510078 0.79 HRH3 (0.49) MEN1KMT2AHRH3MAPTATM
SCHEMBL5980401 0.77 USP2 (0.54) MEN1KMT2AALDH1A1SMN1; SMN2TSHR
SCHEMBL17397432 0.77 GAA (0.34) ALDH1A1POLBL3MBTL1
SCHEMBL1408746 0.77 SMN1; SMN2 (0.45) MEN1KMT2AALDH1A1POLBSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2022037652-A1 LIPID COMPOUNDS AND LIPID NANOPARTICLE COMPOSITIONS Suzhou Abogen Biosciences Co., Ltd. (CN) 2022-02-24 WO disclosed
EP-2090323-A1 Protein-Proteophor Complexes Complex Biosystems GmbH (DE) 2009-08-19 EP disclosed
US-7312016-B2 Chemically amplified positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-12-25 US disclosed