⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Lithium SCHEMBL29592603 | 0.95 | — | — | |
| SCHEMBL28645213 | 0.95 | — | — | |
| SCHEMBL2512423 | 0.84 | — | — | |
| SCHEMBL28646024 | 0.76 | — | — | |
| SCHEMBL15309774 | 0.73 | MEN1 (0.30) | — | |
| SCHEMBL149430 | 0.73 | — | — | |
| SCHEMBL6282145 | 0.71 | TSHR (0.35) | — | |
| SCHEMBL25166709 | 0.70 | — | — | |
| SCHEMBL2511558 | 0.70 | — | — | |
| SCHEMBL5403964 | 0.70 | TP53 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 329 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4612199-A1 | RECYCLATE POLYOL DISPERSION WITH IMPROVED PHASE STABILITY | Dow Global Technologies LLC (US) | 2025-09-10 | — | — | EP | claimed |
| WO-2024137494-A1 | RECYCLATE POLYOL DISPERSION WITH IMPROVED PHASE STABILITY | DOW GLOBAL TECHNOLOGIES LLC (US) | 2024-06-27 | — | — | WO | claimed |
| US-20230420256-A1 | METHOD OF FORMING A PHOTORESIST UNDERLAYER AND STRUCTURE INCLUDING SAME | ASM IP HOLDING B.V. (NL) | 2023-12-28 | — | — | US | claimed |
| US-11735422-B2 | Method of forming a photoresist underlayer and structure including same | ASM IP HOLDING B.V. (NL) | 2023-08-22 | — | — | US | claimed |
| US-10991571-B2 | High temperature atomic layer deposition of silicon oxide thin films | VERSUM MATERIALS US, LLC (US) | 2021-04-27 | — | — | US | claimed |
| US-20210111025-A1 | METHOD OF FORMING A PHOTORESIST UNDERLAYER AND STRUCTURE INCLUDING SAME | ASM IP HOLDING B.V. (NL) | 2021-04-15 | — | — | US | claimed |
| CN-110790737-A | Preparation method of 2, 3-dihydro-3, 5-dihydroxy-6-ethyl-4H-pyran-4-one | 河南中烟工业有限责任公司 | 2020-02-14 | — | — | CN | claimed |
| EP-3135664-B1 | ALKOXIDE COMPOUND, RAW MATERIAL FOR FORMING THIN FILM, METHOD FOR PRODUCING THIN FILM, AND ALCOHOL COMPOUND | ADEKA CORP (JP) | 2019-10-23 | — | — | EP | claimed |
| US-20190189431-A1 | High Temperature Atomic Layer Deposition of Silicon Oxide Thin Films | VERSUM MATERIALS US, LLC (US) | 2019-06-20 | — | — | US | claimed |
| US-9887080-B2 | Method of forming SiOCN material layer and method of fabricating semiconductor device | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2018-02-06 | — | — | US | claimed |
| US-20170256399-A9 | High Temperature Atomic Layer Deposition Of Silicon Oxide Thin Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2017-09-07 | — | — | US | claimed |
| US-20170186603-A1 | METHOD OF FORMING SiOCN MATERIAL LAYER AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2017-06-29 | — | — | US | claimed |
| US-20160365244-A1 | High Temperature Atomic Layer Deposition Of Silicon Oxide Thin Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-12-15 | — | — | US | claimed |
| US-20130295779-A1 | HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF SILICON OXIDE THIN FILMS | VERSUM MATERIALS US, LLC | 2013-11-07 | — | — | US | claimed |
| EP-2650399-A2 | High temperature atomic layer deposition of silicon oxide thin films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-10-16 | — | — | EP | claimed |
| US-20100004414-A1 | POLYMERS FUNCTIONALIZED WITH IMIDE COMPOUNDS CONTAINING A PROTECTED AMINO GROUP | BRIDGESTONE CORPORATION (JP) | 2010-01-07 | — | — | US | claimed |
| US-12637485-B2 | Method of manufacturing alkoxysilane compound | LG CHEM, LTD. (KR) | 2026-05-26 | — | — | US | disclosed |
| US-20260121173-A1 | THERMAL INSULATION SHEET BETWEEN BATTERY CELLS FOR ELECTRIC AUTOMOBILE | SUMITOMO RIKO COMPANY LIMITED (JP) | 2026-04-30 | — | — | US | disclosed |
| EP-0073559-A2 | Process for preparing desacetoxycephalosporanic acid | ELI LILLY AND COMPANY (US) | 1983-03-09 | — | — | EP | disclosed |
| US-4346219-A | Process for preparing desacetoxycephalosporanic acid | ELI LILLY AND COMPANY (US) | 1982-08-24 | — | — | US | disclosed |